二手 DNS / DAINIPPON 629 #9272101 待售
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ID: 9272101
Coater / Developer system, 6"
Specifications:
Variety: Coater
Loader / Unloader
Step motor driving system
Individual unit control
I/H Unit, 6"
Material of wafer handling arm: SUS304 (Modified)
Wafer loading method: Handling arm with vacuum
Digital wafer sensor
Step motor driving system
Bake, 6"
Bake type: HP+CP (H.M.D.S)
Wafer loading method: Wire moving with cylinder
Spin unit (Develop):
Wafer size: 6"
Develop type: Rotation spray with spin motor
Chemical liquid discharge method: N2 Pressurization
Wafer chuck size: 70 mm
Spin cup:
Upper: PolyPropylene resin, 8"
Lower: PolyPropylene resin
Nozzle type: Spray nozzle type
Exhaust control system
Spin cover: Transparent acrylic
Spin motor RPM: Maximum 6000 RPM
Waste liquid drain: Natural drain
Wafer moving: Moving with step motor
Spin unit (Coater):
Wafer size: 6"
Coating method: Rotation with spin motor (Maximum 6000 RPM)
P/R Discharge method: Bellows pump
Wafer chuck size: 70 mm
Spin cup:
Upper: PolyPropylene resin, 8"
Lower: PolyPropylene resin
2 Nozzle type (1/8") / Track
Exhaust control system: Manometer installed
Spin cover: Transparent acrylic
Spin motor RPM: Maximum 6000 RPM
P.R Dispense (maximum): 20 cc / 1 Stock
Waste liquid drain: Manual drain
Wafer moving: Moving with step motor
Bake:
Wafer size: 6"
Bake type: H.P 2-Stage
Bake temperature (maximum): 250°C
Wafer moving: Moving with cylinder
Utility specifications:
Main power:
AC 110 V / 30 A / Single phase
AC 220 V / 30 A / Single phase
Air pressure: 4~5 Kg/Cm²
N2 Pressure: 3~4 Kg/Cm²
Vacuum pressure: 60~70 Cm Hg
Spin exhaust: 100 mm (20 mm Hg)
Bake exhaust: 70 mm (20 mm Hg)
Variety: Develop
Composition
Loader I/H unit develop
I/H Unit unloader
Unit configurations:
Loader / Unloader
Wafer size: 6"
Step motor driving
Individual unit control
I/H Unit:
Wafer size: 6"
Material of wafer handling arm: SUS304 (Modified)
Wafer moving method: Arm with vacuum
Digital wafer sensor
Step motor driving
Spin unit (Develop):
Wafer size: 6"
Develop method: Rotation spray with spin motor
Chemical liquid discharge method: N2 Pressurization
Wafer chuck size: 70 mm
Spin cup:
Upper: PolyPropylene resin, 8"
Lower: PolyPropylene resin
Nozzle type: Spray nozzle type
Exhaust control system: Manometer installed
Spin cover: Transparent acrylic
Spin motor RPM: Maximum 6000 RPM
Waste liquid drain: Natural drain
Wafer moving method: Moving by step motor
Utility specifications:
Main power:
AC 110 V / 30 A / Single Phase
AC 220 V / 30 A / Single Phase
Air pressure: 4~5 Kg / Cm²
N2 Pressure: 3 ~ 4 Kg / Cm²
Vacuum pressure: 60~70 Cm Hg
Spin exhaust: 100 mm (20 mm Hg).
DNS/DAINIPPON 629是由DNS Screen Mfg. Co.開發的一款創新光刻設備。有限公司，旨在提高工廠效率，降低運營成本。該系統由三個組件組成：光敏材料、顯影劑和曝光源。光致抗蝕劑材料是一種光敏溶劑溶解的聚合物，當暴露於某些波長的光時會變硬。顯影劑起到溶劑的作用，在沒有暴露的地方去除了光致抗蝕劑材料。這允許由光敏材料形成圖樣。最後，曝光源是一種輻照裝置，其設計目的是發射特定波長的光，以暴露光敏材料。機器的工作原理是將光敏材料的薄膜噴塗到基材上。然後使用曝光源對光刻膠材料進行曝光，並使用顯影劑去除未曝光的光刻膠材料區域。這會創建可用於多種用途的圖樣,例如創建用於在紡織品上進行絲網印刷的模板。與傳統光刻相比,DNS 629工具具有多種優勢。它需要更少和更便宜的組件,易於設置,並且需要更少的維護。此外,光刻材料的精確度很高,其圖樣偏差僅為1%,遠好於傳統光刻中提供的3-5%的範圍。此外,該資產在成功打印錯綜復雜的圖案方面提供了很大的靈活性。它能很好地處理各種基材，從紙張和織物到玻璃和陶瓷，並且可以輕松處理各種光刻材料。總而言之，DAINIPPON 629機型是尋求降低成本和提高效率的工廠的絕佳選擇。它可以產生高精度和靈活性的復雜和詳細的模式，使其成為許多應用程序的理想選擇。
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