二手 DNS / DAINIPPON SK-2000 #9277248 待售

製造商
DNS / DAINIPPON
模型
SK-2000
ID: 9277248
晶圓大小: 8"
(4) Coater / (4) Developer systems, 8" Resist temperature system Resist Pump Wafer shape: SNNF Wafer cassette: 8" PP MIRAIAL (2) Process blocks (2) Coater heads (2) Barc coater heads (4) Develop heads (2) Adhesion chambers (10) Cooling plates (12) Rapid hot plates (3) Hot plates (1) EEW (1) EEFT (1) IFB (1) Source bottle cabinet (1) Chemical box (HMDS/Solvent/NMDW) (1) Controller cabinet (1) Power box (1) Handling unit controller (1) Carrier station (6) Nozzle Cup: Top cup material: PP Middle cup material: PP Bottom cup material: PPS Spin chuck: Material: Peek Back rinse flow meter with flow sensor Mist nozzle flow meter with flow sensor Edge cleaner flow meter with sensor With VPS+ option Solvent solution supply Drain central Barc Nozzle slit scan nozzle Develop solution supply Central supply Developer Cup PVC Spin chuck PEEK Develop nozzle flow meter with sensor Develop nozzle wash meter with sensor Rinse nozzle flow meter with sensor Back rinse flow meter with sensor Develop temperature System Control for 1 line x 2 Drain central Adhesion Method vapor prime by N2 bubbling Hot plate 60-150 deg by 0.1 deg pitch HMDS solution supply central supply Hot plate Method proximity bake with ceramic ball Hot plate 50-180 deg by 0.1 deg pitch Cooling plate Rapid hot plate.
DNS/DAINIPPON SK-2000是一種數字光刻設備,它使用激光器和新穎的光學系統來提高曝光圖樣的準確性,並有助於確保在特征尺寸小至幾百納米的基板上精確地復制特征。DNS SK2000利用脈沖激光束,在基板上聚焦到5 um的光斑大小,安裝在x-y檢流計掃描儀上。脈沖寬度可在2到12n之間編程,能量可在50mJ到1J之間編程。激光安裝在連接到精密x-y檢流計掃描儀的垂直掃描儀上。激光和掃描儀同步,在基板上創建精確的曝光模式.然後由用戶界面定義曝光模式,允許在基板上繪制曝光模式。DAINIPPON SK 2000還利用了一個專有的光學單元,它結合了曝光模式和底物的薄膜厚度。這樣可以在特征尺寸小至幾百納米的基板上實現精確的曝光模式。此外,還可以針對特定基板優化曝光模式,從而提高精度和精度。除了激光和光學系統外,DNS/DAINIPPON SK 2000還配備了溫度控制裝置,允許在曝光過程中使用溫度敏感的基板。這樣可以提高暴露材料的電阻率和耐熱性。DNS SK-2000除了精確度和精確度外,還提供多種可使用的曝光模式。它設計用於各種工藝,包括光刻、沈積技術,如化學氣相沈積和幹蝕刻。其廣泛的曝光模式允許提高吞吐量和縮短處理時間。DNS SK 2000是一款先進的光刻機。它利用了幾種獨特的功能,包括脈沖激光、先進的光學工具、精密掃描儀和溫度控制單元。這些特性能夠精確和精確地再現基板上的曝光模式,其特性尺寸小至幾百納米。此外,它提供的各種曝光模式可提高吞吐量和縮短處理時間。這使得DNS/DAINIPPON SK2000光刻、沈積技術和幹蝕刻等廣泛應用的理想選擇。
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