二手 FSI / TEL / TOKYO ELECTRON Mercury MP #9161972 待售
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ID: 9161972
優質的: 1996
Spray processor, 8"
Software: 11
FSI Standard exhaust config: Yes
Dual exhaust: No
Turntable style (PFA vs. Ti vs. SS): PFA 918600-003
Motor and motor speed controller: Upgrade 232608-003
Booster pump: Yes, not dual
Helios: Yes
Ti T/C's: No
Canister remote length: 25'
Vertical lift kit length: 20'
Vertical lift kit: Some canisters
Center SP etch probe: No
SBSP: Yes
SBSP Etch probe: Yes
I/R Htr(P)ost Man / (C)hem spec: No
I/R Heater split manifold: No
I/R Heater bypass valves: No
CPU 286: No
CPU 486 25 mH: No
CPU 486 80 mH: No
CPU 586 Yes: 922081-001
HF Last: Yes
LPP w / Flowmeter: Yes
HF Last rinse bypass: Yes
DI MIX: Yes
H2SO4(Analog vs. NT): Yes
H2O2 (Analog vs. NT): NT 30-300, 915191-102
HF400: Yes
HF402 (Analog vs. NT): NT 15-150, 915191-101
HCL (Analog vs. NT): NT 15-150, 915191-101
NH4OH (Analog vs. NT): NT 15-150, 915191-101
Can position 1: Sulphuric (H2SO4)
Can position 2: Hydrofluoric (10:1)
Can position 3: Hydrofluoric (10:1)
Can position 4: Ammonium hydroxide (NH4OH)
Can position 5: Hydrochloric (HCl)
Can position 6: Hydrogen peroxide (H2O2)
HF / DI On-line blending: Yes
Manifold type: PFA
DI Flow switch / monitor: No
N2 Flow monitor: No
Recirculation: No
Chemical heater (Stand alone): No
N2 Heater: No
UPS: No
Component rinse: No
SECS Comm: Yes
Rear access: Yes
Chemical sampling: No
Photohelic monitor: Yes
MHS: No
Dual canister rotary board: No
Autofill: HF- SULFURIC
Remote touchscreen: No
Dual touchscreen: No
Direct feed: No
Process application #1: RCA Clean
Process application #2: B Clean
Process application #3: SPM Only
Process application #4: HF Last
Pressure / Flow settings
Bowl exhaust - IWC: 0.8 +/- 0.2
Bowl exhaust - FPM: N/A
1996 vintage.
FSI MERCURY MP是一款由FSI International, Inc開發的光刻膠設備。它用於半導體蝕刻過程中,半導體晶片暴露在紫外線下,改變了暴露材料的性質,更容易蝕刻掉。MERCURY MP系統使用真空光敏裝置,允許對基板進行精確蝕刻。該機旨在為半導體晶片的細線蝕刻提供高性能、可靠的環境。真空光致抗蝕劑工具使用光投射資產和輻射室均勻暴露於紫外線。在輻照室中,高能紫外線投射到晶片上,使光敏材料暴露於光。曝光控制蝕刻深度,並消除了材料的底切或過度蝕刻的機會。該模型具有多種特點,有助於確保精確的控制和準確性。該設備使用精確的成像光學器件和堅固、高速的紅外激光將光引導到晶圓上,允許非常精細的線路分辨率。該系統還利用精確的掩蔽和成像系統,結合高效的高性能光學投影單元(OPSM)進行均勻曝光。激光還能夠快速調節其輸出輻射,從而對曝光時間進行精確控制。FSI MERCURY MP機適合於廣泛的光刻工藝,如深蝕刻和超細圖案。它還有一個先進的、可編程的用戶界面,可以讓用戶快速、輕松地設置參數,實時查看蝕刻過程。MERCURY MP工具是一種功能強大、精密的光刻資產,適用於半導體行業的精密蝕刻。它是生產高密度集成電路以及其他微電子器件的理想選擇。該模型提供了可靠和高性能的環境,具有精確的成像光學器件和堅固的高速激光器,以及可編程的用戶界面,從而能夠快速輕松地設置參數。
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