二手 SEMITOOL Raider #293600285 待售
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ID: 293600285
晶圓大小: 12"
優質的: 2008
Systems, 12"
(8) Chambers
Substrate: Si, 12"
Chiller
DHF Mix tank
CO2 Bottle
S2 Computer
502SE Controller
Remote PPS
MARATHON Standard
Automation:
Type: (2) FOUP WIP (PGV compatible)
COAXIAL HT Robot
STI Robot controller
End effect controller:
Edge grip
Wet transfer edge grip
FOUP ID: ASYST, P/N: 9750-2000-000
HERMOS RF Tag reader
Vacuum source
Wafer protrusion sensor
Process module:
CPC 1, 10, 12
Process: SRD / Prewet
PTFE Spray chamber P/N: 271T0020-03
Rotor: Cantilever, N2 Wafer purge
Bulk fill supply with filter, 5"
IW Drain
Spray bar nozzel, P/N: 341 T0011-05
CPC 2
Process: Ni plating
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Anode, P/N: 110T0198-01, 111T0000-10
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
Wafer extraction (mechanical)
Flow meter on chemical line
Shield / Weir, P/N: 111T1204-511
CPC 3, 4, 9
Process: Solder plating (eutectic)
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
CPC 5, 6, 7, 8
Process: Solder plating (high lead)
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
Wafer extraction
Flow meter on chemical line
Shield / Weir, P/N: 111T1204-511
CPC 11
Process: Cu Plating
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Anode, P/N: 111T1197-01
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
Wafer extraction
Flow meter on chemical line
Shield / Weir, P/N: 111T1204-511
Capacity: 48 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 50-55°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: ARU / CDU / Bulk fill / Manual fill tube
Sample Port
CPC 2
Ni Plating solution
Carbon polishing filter
Conditioning electrodes
pH Monitor
Sight tube
Power supply
Tank 2: High lead solder
Capacity: 120 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 25-35°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: Bulk fill / CDU / Manual fill tube
Sample Port
CPC 5, 6, 7, 8
Chemical: High lead plating Solution
Sight tube
Tank 3: Eutectic solder
Capacity: 120 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 25-35°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: Bulk fill / CDU / Manual fill tube
Sample port
CPC 3, 4, 9
Chemical: Eutectic plating solution
Sight tube
Tank 4: Cu
Capacity: 48 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 25°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: ARU / CDU / Bulk fill / Manual fill tube
Sample port
CPC 11
Cu Plating solution
Sight tube
Drains:
IW
Eutectic
Hi lead
Ni
Cu
Process:
Cu
Ni
Eutectic
High lead plating
Options:
(3) Heater chillers
AARU
Dl Booster pump cabinet and Interface
Power supply: 480 V, 4 Wire, 3 Phase
2008 vintage.
SEMITOOL Raider是由半導體設備制造商SEMITOOL於2001年推出的光阻設備。該系統使用噴塗塗層在半導體晶片上沈積一層光致抗蝕劑,用於隨後的制圖過程。入侵者的特點是有幾個計算機控制的組件,包括一個負載鎖定運輸車,一個噴霧臂和一個粒子控制單元。SEMITOOL Raider每小時處理多達50個晶片,並在整個晶片表面產生均勻的抗蝕性輪廓。它從盒式磁帶中卸載晶片,將其輸送到噴霧臂,沈積抗蝕層,並將其輸送到外部輸送機。噴霧臂能夠施加薄層(100-200 nm)的SU-8抗蝕劑。顆粒控制裝置可確保顆粒不汙染光致抗蝕劑,確保抗蝕劑塗層均勻。它監測噴霧室內的氧氣濃度、濕度、溫度和壓力,以及監測環境中顆粒的濃度。Raider還有一個自動對焦單元,它可以保持對整個晶片表面的恒定聚焦。SEMITOOL Raider具有眾多的安全特性,可以防止外部因素,如靜電積聚和廢氣。每個系統都可以單獨校準,以達到最大精度,噴霧臂完全機動化,以達到最大控制和精度。Raider是一種模塊化機器,能夠隨著時間的推移升級其電子產品和組件。它的設計方式使其能夠加工直徑在1到12英寸之間的晶片。SEMITOOL Raider是半導體工業光刻膠應用的可靠選擇工具。它維護程度低,可以例行處理大批量晶片,不需要過多的監督。它產生薄而均勻的抗蝕層,並確保環境保持清潔和無顆粒。Raider的構建考慮到了用戶的安全,其各種安全功能確保操作員始終保持安全。
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