二手 SEMITOOL Raider #293600285 待售

製造商
SEMITOOL
模型
Raider
ID: 293600285
晶圓大小: 12"
優質的: 2008
Systems, 12" (8) Chambers Substrate: Si, 12" Chiller DHF Mix tank CO2 Bottle S2 Computer 502SE Controller Remote PPS MARATHON Standard Automation: Type: (2) FOUP WIP (PGV compatible) COAXIAL HT Robot STI Robot controller End effect controller: Edge grip Wet transfer edge grip FOUP ID: ASYST, P/N: 9750-2000-000 HERMOS RF Tag reader Vacuum source Wafer protrusion sensor Process module: CPC 1, 10, 12 Process: SRD / Prewet PTFE Spray chamber P/N: 271T0020-03 Rotor: Cantilever, N2 Wafer purge Bulk fill supply with filter, 5" IW Drain Spray bar nozzel, P/N: 341 T0011-05 CPC 2 Process: Ni plating Chamber, P/N: 271T0130-01 CFD III Ring, P/N: 213T1055-501 Anode, P/N: 110T0198-01, 111T0000-10 Plating PS, P/N: T16852-118 Wafer present sensor Mercury contact Wafer extraction (mechanical) Flow meter on chemical line Shield / Weir, P/N: 111T1204-511 CPC 3, 4, 9 Process: Solder plating (eutectic) Chamber, P/N: 271T0130-01 CFD III Ring, P/N: 213T1055-501 Plating PS, P/N: T16852-118 Wafer present sensor Mercury contact CPC 5, 6, 7, 8 Process: Solder plating (high lead) Chamber, P/N: 271T0130-01 CFD III Ring, P/N: 213T1055-501 Plating PS, P/N: T16852-118 Wafer present sensor Mercury contact Wafer extraction Flow meter on chemical line Shield / Weir, P/N: 111T1204-511 CPC 11 Process: Cu Plating Chamber, P/N: 271T0130-01 CFD III Ring, P/N: 213T1055-501 Anode, P/N: 111T1197-01 Plating PS, P/N: T16852-118 Wafer present sensor Mercury contact Wafer extraction Flow meter on chemical line Shield / Weir, P/N: 111T1204-511 Capacity: 48 L Style: Unsealed NPP Heat exchange coils Temperature: 50-55°C Filter, 10" Sensor: (5) Floats LEVITRONIX BPS 3 Pump WK AP50 Pump Supply: ARU / CDU / Bulk fill / Manual fill tube Sample Port CPC 2 Ni Plating solution Carbon polishing filter Conditioning electrodes pH Monitor Sight tube Power supply Tank 2: High lead solder Capacity: 120 L Style: Unsealed NPP Heat exchange coils Temperature: 25-35°C Filter, 10" Sensor: (5) Floats LEVITRONIX BPS 3 Pump WK AP50 Pump Supply: Bulk fill / CDU / Manual fill tube Sample Port CPC 5, 6, 7, 8 Chemical: High lead plating Solution Sight tube Tank 3: Eutectic solder Capacity: 120 L Style: Unsealed NPP Heat exchange coils Temperature: 25-35°C Filter, 10" Sensor: (5) Floats LEVITRONIX BPS 3 Pump WK AP50 Pump Supply: Bulk fill / CDU / Manual fill tube Sample port CPC 3, 4, 9 Chemical: Eutectic plating solution Sight tube Tank 4: Cu Capacity: 48 L Style: Unsealed NPP Heat exchange coils Temperature: 25°C Filter, 10" Sensor: (5) Floats LEVITRONIX BPS 3 Pump WK AP50 Pump Supply: ARU / CDU / Bulk fill / Manual fill tube Sample port CPC 11 Cu Plating solution Sight tube Drains: IW Eutectic Hi lead Ni Cu Process: Cu Ni Eutectic High lead plating Options: (3) Heater chillers AARU Dl Booster pump cabinet and Interface Power supply: 480 V, 4 Wire, 3 Phase 2008 vintage.
SEMITOOL Raider是由半導體設備制造商SEMITOOL於2001年推出的光阻設備。該系統使用噴塗塗層在半導體晶片上沈積一層光致抗蝕劑,用於隨後的制圖過程。入侵者的特點是有幾個計算機控制的組件,包括一個負載鎖定運輸車,一個噴霧臂和一個粒子控制單元。SEMITOOL Raider每小時處理多達50個晶片,並在整個晶片表面產生均勻的抗蝕性輪廓。它從盒式磁帶中卸載晶片,將其輸送到噴霧臂,沈積抗蝕層,並將其輸送到外部輸送機。噴霧臂能夠施加薄層(100-200 nm)的SU-8抗蝕劑。顆粒控制裝置可確保顆粒不汙染光致抗蝕劑,確保抗蝕劑塗層均勻。它監測噴霧室內的氧氣濃度、濕度、溫度和壓力,以及監測環境中顆粒的濃度。Raider還有一個自動對焦單元,它可以保持對整個晶片表面的恒定聚焦。SEMITOOL Raider具有眾多的安全特性,可以防止外部因素,如靜電積聚和廢氣。每個系統都可以單獨校準,以達到最大精度,噴霧臂完全機動化,以達到最大控制和精度。Raider是一種模塊化機器,能夠隨著時間的推移升級其電子產品和組件。它的設計方式使其能夠加工直徑在1到12英寸之間的晶片。SEMITOOL Raider是半導體工業光刻膠應用的可靠選擇工具。它維護程度低,可以例行處理大批量晶片,不需要過多的監督。它產生薄而均勻的抗蝕層,並確保環境保持清潔和無顆粒。Raider的構建考慮到了用戶的安全,其各種安全功能確保操作員始終保持安全。
還沒有評論