二手 SEMITOOL Raider #293635960 待售
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ID: 293635960
晶圓大小: 12"
Single wafer processing system, 12"
Model No: RE12F2ECD1204
Substrate: Si, 12"
S2 Computer
502SE Controller
Remote PPS
MARATHON Standard
Interface: CDRU, AARU
(6) CCD Cameras
Process: Cu, Ni, Eutectic, High lead plating
Automation:
Type: (2) FOUP WIP (PGV Compatible)
COAXIAL HT Robot
STI Robot controller
End effect controller:
Edge grip
Wet transfer edge grip
FOUP ID: ASYST, P/N: 9750-2000-000
HERMOS RF Tag reader
Vacuum source
Wafer protrusion sensor
Process module:
CPC 1, 10, 12:
Process: SRD / Prewet
PTFE Spray chamber P/N: 271T0020-03
Rotor: Cantilever, N2 Wafer purge
Bulk fill supply with filter, 5"
IW Drain
Spray bar nozzel, P/N: 341 T0011-05
CPC 2:
Process: Ni Plating
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Anode, P/N: 110T0198-01, 111T0000-10
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
Wafer extraction (Mechanical)
Flow meter on chemical line
Shield / Weir, P/N: 111T1204-511
CPC 3, 4, 9:
Process: Solder plating (Eutectic)
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
CPC 5, 6, 7, 8:
Process: Solder plating (High lead)
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
Wafer extraction
Flow meter on chemical line
Shield / Weir, P/N: 111T1204-511
CPC 11:
Process: Cu Plating
Chamber, P/N: 271T0130-01 CFD III
Ring, P/N: 213T1055-501
Anode, P/N: 111T1197-01
Plating PS, P/N: T16852-118
Wafer present sensor
Mercury contact
Wafer extraction
Flow meter on chemical line
Shield / Weir, P/N: 111T1204-511
Capacity: 48 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 50-55°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: ARU / CDU / Bulk fill / Manual fill tube
Sample port
CPC 2
Ni Plating solution
Carbon polishing filter
Conditioning electrodes
pH Monitor
Sight tube
Power supply
Tank 2: High lead solder
Capacity: 120 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 25-35°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: Bulk fill / CDU / Manual fill tube
Sample port
CPC 5, 6, 7, 8
Chemical: High lead plating solution
Sight tube
Tank 3: Eutectic solder
Capacity: 120 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 25-35°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: Bulk fill / CDU / Manual fill tube
Sample port
CPC 3, 4, 9
Chemical: Eutectic plating solution
Sight tube
Tank 4: Cu
Capacity: 48 L
Style: Unsealed NPP
Heat exchange coils
Temperature: 25°C
Filter, 10"
Sensor: (5) Floats
LEVITRONIX BPS 3 Pump
WK AP50 Pump
Supply: ARU / CDU / Bulk fill / Manual fill tube
Sample port
CPC 11
Cu Plating solution
Sight tube
Drains: IW, Eutectic, Hi lead, Ni, Cu
Options:
(3) Heater chillers
Dl Booster pump cabinet and Interface
Power supply: 480 V, 4 Wire, 3-Phase.
SEMITOOL Raider是一款先進的自動化光刻設備,旨在滿足當今半導體和電子元件生產的嚴格性能和精度要求。該系統提供全自動晶片曝光和處理功能,使制造商能夠最大限度地提高產量、降低成本並提高生產吞吐量。入侵者配備精密8英寸曝光單元,利用2048光束和424毫米數值光圈(NA)鏡頭,可施加高達30mm的曝光場。這使用戶能夠達到交付最高質量光刻膠產品所需的準確性和分辨率。曝光機還配備了回拉對準能力和自動基板夾緊和邊緣檢測,允許準確曝光和對準整個基板表面。除了卓越的曝光能力外,SEMITOOL Raider Photoresist Tool還具有高級材料管理解決方案,旨在簡化光刻膠分配,確保配方設置和參數的準確性。此高級軟件解決方案使用戶無需手動輸入即可快速輕松地訪問、查看和更新每種類型光刻膠的配方。這樣可以消除出錯的可能性,並確保所有配方的結構正確,並針對原始性能進行優化。Raider還包括集成的薄膜測量功能,使客戶能夠在光刻膠資產的整個生命周期中監控質量。此質量測量解決方案可實現自動化和手動質量審查,並提供有關抗蝕性厚度、均勻性和塗層質量的寶貴數據和分析。這些功能I有助於確保整個生產過程中的一致性和性能,同時降低短期和長期成本。總體而言,SEMITOOL Raider是一種高度精密且先進的光刻膠模型,提供卓越的曝光、材料管理和薄膜測量功能。它的自動化過程有助於最大限度地提高產量、降低成本和提高生產吞吐量。利用先進的功能和數據分析,制造商可以依靠Raider可靠地提供高質量、高精度的抵抗產品。
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