二手 SEMITOOL Raider #293635960 待售

製造商
SEMITOOL
模型
Raider
ID: 293635960
晶圓大小: 12"
Single wafer processing system, 12" Model No: RE12F2ECD1204 Substrate: Si, 12" S2 Computer 502SE Controller Remote PPS MARATHON Standard Interface: CDRU, AARU (6) CCD Cameras Process: Cu, Ni, Eutectic, High lead plating Automation: Type: (2) FOUP WIP (PGV Compatible) COAXIAL HT Robot STI Robot controller End effect controller: Edge grip Wet transfer edge grip FOUP ID: ASYST, P/N: 9750-2000-000 HERMOS RF Tag reader Vacuum source Wafer protrusion sensor Process module: CPC 1, 10, 12: Process: SRD / Prewet PTFE Spray chamber P/N: 271T0020-03 Rotor: Cantilever, N2 Wafer purge Bulk fill supply with filter, 5" IW Drain Spray bar nozzel, P/N: 341 T0011-05 CPC 2: Process: Ni Plating Chamber, P/N: 271T0130-01 CFD III Ring, P/N: 213T1055-501 Anode, P/N: 110T0198-01, 111T0000-10 Plating PS, P/N: T16852-118 Wafer present sensor Mercury contact Wafer extraction (Mechanical) Flow meter on chemical line Shield / Weir, P/N: 111T1204-511 CPC 3, 4, 9: Process: Solder plating (Eutectic) Chamber, P/N: 271T0130-01 CFD III Ring, P/N: 213T1055-501 Plating PS, P/N: T16852-118 Wafer present sensor Mercury contact CPC 5, 6, 7, 8: Process: Solder plating (High lead) Chamber, P/N: 271T0130-01 CFD III Ring, P/N: 213T1055-501 Plating PS, P/N: T16852-118 Wafer present sensor Mercury contact Wafer extraction Flow meter on chemical line Shield / Weir, P/N: 111T1204-511 CPC 11: Process: Cu Plating Chamber, P/N: 271T0130-01 CFD III Ring, P/N: 213T1055-501 Anode, P/N: 111T1197-01 Plating PS, P/N: T16852-118 Wafer present sensor Mercury contact Wafer extraction Flow meter on chemical line Shield / Weir, P/N: 111T1204-511 Capacity: 48 L Style: Unsealed NPP Heat exchange coils Temperature: 50-55°C Filter, 10" Sensor: (5) Floats LEVITRONIX BPS 3 Pump WK AP50 Pump Supply: ARU / CDU / Bulk fill / Manual fill tube Sample port CPC 2 Ni Plating solution Carbon polishing filter Conditioning electrodes pH Monitor Sight tube Power supply Tank 2: High lead solder Capacity: 120 L Style: Unsealed NPP Heat exchange coils Temperature: 25-35°C Filter, 10" Sensor: (5) Floats LEVITRONIX BPS 3 Pump WK AP50 Pump Supply: Bulk fill / CDU / Manual fill tube Sample port CPC 5, 6, 7, 8 Chemical: High lead plating solution Sight tube Tank 3: Eutectic solder Capacity: 120 L Style: Unsealed NPP Heat exchange coils Temperature: 25-35°C Filter, 10" Sensor: (5) Floats LEVITRONIX BPS 3 Pump WK AP50 Pump Supply: Bulk fill / CDU / Manual fill tube Sample port CPC 3, 4, 9 Chemical: Eutectic plating solution Sight tube Tank 4: Cu Capacity: 48 L Style: Unsealed NPP Heat exchange coils Temperature: 25°C Filter, 10" Sensor: (5) Floats LEVITRONIX BPS 3 Pump WK AP50 Pump Supply: ARU / CDU / Bulk fill / Manual fill tube Sample port CPC 11 Cu Plating solution Sight tube Drains: IW, Eutectic, Hi lead, Ni, Cu Options: (3) Heater chillers Dl Booster pump cabinet and Interface Power supply: 480 V, 4 Wire, 3-Phase.
SEMITOOL Raider是一款先進的自動化光刻設備,旨在滿足當今半導體和電子元件生產的嚴格性能和精度要求。該系統提供全自動晶片曝光和處理功能,使制造商能夠最大限度地提高產量、降低成本並提高生產吞吐量。入侵者配備精密8英寸曝光單元,利用2048光束和424毫米數值光圈(NA)鏡頭,可施加高達30mm的曝光場。這使用戶能夠達到交付最高質量光刻膠產品所需的準確性和分辨率。曝光機還配備了回拉對準能力和自動基板夾緊和邊緣檢測,允許準確曝光和對準整個基板表面。除了卓越的曝光能力外,SEMITOOL Raider Photoresist Tool還具有高級材料管理解決方案,旨在簡化光刻膠分配,確保配方設置和參數的準確性。此高級軟件解決方案使用戶無需手動輸入即可快速輕松地訪問、查看和更新每種類型光刻膠的配方。這樣可以消除出錯的可能性,並確保所有配方的結構正確,並針對原始性能進行優化。Raider還包括集成的薄膜測量功能,使客戶能夠在光刻膠資產的整個生命周期中監控質量。此質量測量解決方案可實現自動化和手動質量審查,並提供有關抗蝕性厚度、均勻性和塗層質量的寶貴數據和分析。這些功能I有助於確保整個生產過程中的一致性和性能,同時降低短期和長期成本。總體而言,SEMITOOL Raider是一種高度精密且先進的光刻膠模型,提供卓越的曝光、材料管理和薄膜測量功能。它的自動化過程有助於最大限度地提高產量、降低成本和提高生產吞吐量。利用先進的功能和數據分析,制造商可以依靠Raider可靠地提供高質量、高精度的抵抗產品。
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