二手 SEMIX / TAZMO TR 6133UD #293598589 待售
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ID: 293598589
晶圓大小: 4"-6"
Coater systems, 4"-6"
(3) Zone hotplate
Single / double cassette
Fluoroware type with pitch of 3/16" for (25) Wafers
SOG Nozzles: 0.85mm, 1/16" tubing
Nozzle capping mechanism
Nozzle cleaning with solvent
Splash back cup cleaning with solvent
Adjustable suck back valve
Polypropylene tank: 1 gallon
PVC, 11"
Teflon solvent tubing and suck back valve
(3) Vacuum chuck hot plates
Heater capacity: 3.8 Kw (total) at 250°C
Baking time: 0-999.9 secs with increments of 0.1 sec
Normal indicator setting: ±3°C
SOG Filter: .22 µm Fluoropore fitter
Chemical cabinet: 5 Gallon capacity
(2) Nozzles back side rinses (edge bead removal)
Solvent filter: MILLIPORE CWFG00403 Fluorex / WGFG04HP6 Wafergard
Gas line filter: MILLIPORE GTL WGFG01D Wafergard 0.22 µm filter
Wafer transport system:
Indexing elevator
Vacuum chuck
Shuttle mechanism
Walking beam
Control unit:
Microprocessor: INTEL 8065 (main and (2) sub CPUs)
Speed: 100-9000 RPM (4") / 8000 RPM (6") ± .15% (50-1990 RPM) and ±.1% (2000-6000 RPM) Alarm for speed ±3% of RPM (speed higher than 300 RPM)
Acceleration: Maximum rate 1 sec for 0 to 5000 RPM (programmable in increments of 1 sec)
Process: 20-Steps, 8 / 16 recipes
Temperature control: ±1°C Uniformity with alarm setting of ±3°C
Spinning, dispensing time: 0-99 Sec programmable
Baking time: 0-999 Sec programmable
Process display: Back-lit LCD.
SEMIX/TAZMO TR 6133UD是一種全自動、用途廣泛的光刻設備,可用於廣泛的工業應用。它的設計考慮到了光刻技術,能夠產生深蝕刻,平面化和高分辨率圖樣到0.5微米的分辨率。主機由數字控制臺和真空臺組成。控制臺操作真空臺的微米刻度X、Y、Z軸,對光刻膠圖案進行精確對準定位。真空臺還包含一個可編程曝光室和一個自動裝卸光刻膠的分配系統。SEMIX TR 6133UD提供了一系列功能,包括數字圖像記錄器、分配和驅動器控制、晶圓切換單元和真空機。圖像記錄器記錄所需的綠光曝光模式,然後用於驅動X、Y和Z軸的運動控制。利用分配和驅動控制來精確控制光刻膠在制圖過程中的流動和微米尺度級的運行。晶片移轉工具有助於在設備和加工室之間傳輸光刻塗層晶片。真空資產有助於確保高分辨率圖樣的均勻清潔表面。TAZMO TR 6133UD提供優異的性能,可重復性10微米,高分辨率0.5微米。此外,該模型還擁有廣泛的支持設備,以幫助開發基於光刻膠的設備和產品。這包括自動分配工具、高速掃描工具、光敏濺射系統和一系列基於光敏的沈積系統。TR 6133UD是一種先進的光刻設備,它提供高分辨率的陣列功能、出色的可重復性和廣泛的支持工具。它旨在滿足需要光刻程序的工業應用的需要,並且能夠在很小的時間內提供高精度的結果。
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