二手 SVG 88 Series #9033562 待售
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ID: 9033562
Track system, 6"
Wafer: 6" glass
Wafer dual Track, 6"
Wafer flow: Left to Right
Transport wafer: ATS arm
Software have 99 process program capability with up to 9 event per program
Can "link" two or more programs together to create longer programs
Intergrades components exercise for system maintenance
Real time displaying motor speed
Capable to save or re-stored recipe and option data into CPU flash when CPU need repair
Auto calibration HPO wafer carrier motor
Full "2-way" diagnostics
Full range of programmable options
All modules grounded to Copper bar ground 1” X ¼” X 80”, “Copper bar ground” grounded to facility ground discharge static, clean signal
Coater Process: Moving/pivoting arm dispense with (3) dispense capability
Developer process: Moving dispense arm with 2 sprays, 2 stream nozzle, Air ring, top rinse and back side rinse
Track 1: Send-Vapor Prime-Chill-Coat-bake-Chill-Receive
Track 2: Send-Bake-Chill-Develop-Bake-Chill-Receive
Track 3: Send-Send - Coat-Bake - Receive-Receive
Track 4: Send-Send - Coat-Bake - Receive-Receive
Indexer Assembly:
Banner wafer sensor or Capacitive sensor
Grey Teflon coat platform
3/16" or 1/4" pitch (for 25 or 20 wafer cassettes)
Coater Assembly:
Moving/pivoting dispense assembly with 3 dispense capability
Peek material wafer chuck
Top EBR
Bottom EBR
Top, bottom EBR, catch cup rinse, tub fill (fill Pre-dispense cup by option select timing to prevent dispense nozzle dry off at home position, idle mode)
Upgraded Centering unit with dual cylinder shaft
Digital pressure (vacuum) switch
Sub-micron servo motor using brushless motor with Pacific Scientific controller max 6500 RPM +/-1 RPM no need calibration
Flat finder, wafer run smooth at high speed
Upgraded Stepper motor up/down 3 position Assy. for Spindle replace 3 position cylinder more stable, reliable
1 upgrade Cybor pump /each track
1 five gallon canister for EBR
1 five gallon canister for CCR
1 three gallon canister for Tub fill
CKD valve replacement for high cost, obsolete valve for Spindle valve assembly
Catch cup Assembly is easily removable, cleanable, also catch cup have the catch cup rinse assembly, clean itself by option select to set catch cup wash wafer count, catch cup wash time interval
Tub fill pre-dispense cup by option select fill solvent to the cup by timing prevent nozzle dry off when track at idle position, option select purge the dispense nozzle clean the tip itself before process, amount is equal amount to real process
High purity Teflon tubing for fluid line, dispense line
High level sensor for coater drain jar work with software
Low level sensor for Photo Resist bottle work with software
Low level sensor for EBR canister work with software
Developer Assembly:
Moving dispense arm Assembly with 2 spray, 2 stream nozzle
Peek material wafer chuck
Sub-micron servo motor using brushless motor with Pacific Scientific controller Max 6500RPM +/-1RPM no need calibration
Top rinse and backside rinse and air ring
Three way Teflon valve for DI water return for top rinse prevent particle build up
Digital vacuum switch
Upgraded Stepper motor up/down 3 position Assy. for Spindle replace 3 position cylinder
Flat finder, wafer run smooth at high speed
Cooling jacket for Developer fluid line,
CKD valve replacement for high cost, obsolete valve for Spindle valve assembly
Vapor Prime Assembly:
Stainless steel exhaust
Contact or proximity control bake with lid up
Vacuum or HMDS bake with lid down
All Teflon dispense lines
Pressure canister for HMDS
Hard clear anodized lid
Digital pressure (vacuum switch)
Cast-in heat element 450 W
Capable of operating at temperature ranging from 50 degree C to 400 degree C in dehydration bake cycle and to 200 degree C in vapor prime cycle
RTD temperature probe with 0.1 degree C increment readout
Remote digital temperature controller
Watlow EZ zone controller
Dual digital LED display
Auto tuning, +/-0.1% calibration accuracy
PID control-no drift or shifting
Temperature uniformity under +/- 2 degree C
Hot Plate Oven Assembly:
Stainless steel exhaust
Hard clear anodized HPO block
Three pin wafer lift assembly
HPO block with side-mounted vacuum port-guaranteed no leak
Contact or proximity control bake
Cast-in heater elements 450W
Watlow EZ zone Temperature controller
Dual digital LED display
Auto tuning, ±0.1% calibration accuracy
PID control – no drift or shifting
Temperature uniformity under ±2°C
RTD temperature probe with 0.1°C increment readout
HPO temperature range from 50°C to 400°C
Digital pressure (vacuum) switch
Remote digital temperature controller
Chill Plate Assembly:
Hard clear anodized chill plate
Three pin wafer lift assembly
Digital pressure (vacuum) switch
Power: 208VAC, 3 phase, 60Hz.
SVG 88系列光刻膠是由SVG America創造的專用設備,用於印刷行業。該系統設計用於在紙張、布、膜、箔、柔性基板等基板上提供可靠、耐用和精確的光刻材料塗層。88系列光刻膠單元由一個可更換的噴嘴式塗抹器、一個內置模式生成單元的控制器和一個能夠分配所需精確數量光刻膠的平臺組成。該機器能夠制造單層和多層塗層。噴塗器使用靜電沈積光敏材料,可以精確調節,確保在基板上沈積均勻的層。SVG 88系列光致抗蝕劑工具的設計具有很高的可靠性和耐用性.該資產經認證可用於惡劣環境,可安全用於各種工業部門。該模型旨在每次提供準確的結果,並利用先進的軟件幫助保持基板溫度的一致性。該設備還能夠產生各種圖案,使其成為各種印刷應用的可行補充。使用該系統,可以復制圖像的多個副本或簡單地應用單層或多層覆蓋。該單元還能夠實現模式的精確配準,這意味著在鋪設抗蝕劑時不會發生重叠。88系列光刻機也在設計時考慮到了用戶友好的界面。該工具易於調整和控制,不需要復雜的設置。該資產能夠創建廣泛的模式,因此用戶可以輕松調整設置以獲得最佳結果。此外,該模型是完全自動化的,允許高效操作,並且能夠自我校準以提高精度。總之,SVG 88系列光刻設備是一種可靠、耐用的系統,設計用於各種印刷應用。該裝置的設計可提供準確和可重復的塗層,並且完全自動化,以便高效運行。該機器能夠創建多種模式,而且用戶友好,不需要復雜的設置。
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