二手 TEL / TOKYO ELECTRON ACT 8 #9312079 待售

ID: 9312079
晶圓大小: 8"
優質的: 2007
(4) Coater / (4) Developer system, 8" (2) Chemical boxes (2) SMC Thermo controllers TEAM KOREA Temperature and humidity controller AC Power box Left to right Wafer and carrier type: Notch (25) Slots (4) Uni-cassette loaders Carrier station: Type: Normal uni-cassette (4) Cassette stages Pick-up cassette Uni-cassette system Coater unit (2-1, 2-2, 2-3, 2-4 Module): (3) Dispense nozzles with temperature controlled line RDS Pump Rinse nozzle: Back / EBR / Solvent bath Rinse system: 3 Liters (2) buffer tank systems PR Suck-back valve type: AMC Suck-back valve Programmable side rinse Direct drain Developer unit (3-1, 3-2, 3-3, 3-4 Module): Nozzle for each unit 2-Stream nozzles for DI rinse 2-Points for back side rinse on each unit Developer system: 3 Liters (2) buffer tank systems Developer temperature control system Direct drain (2) Adhesion units: Sealing closed chamber with built-in hot plate HMDS Tank with float sensor Interface type: NIKON High temperature hot plate (16) Low temp hot plates (9) Chill Plates (CPL) (4) Chilling Hot Plate (CHP) process station (3) Transition Stage (TRS) modules Transition Chill Plate (TCP) module Wafer Edge Exposure (WEE) module (2) Temperature control units Missing parts: Main controller (4) Coater cups (2-1, 2-2, 2-3, 2-4) (3) Developer cups (3-1, 3-2, 3-3) Main display panel CRA X-Axis motor CSB Add on board (9) Coater PR pumps (2-1.2-2.2-3) IRA Y-Axis motor driver IRA Tweezers LHP Module cover Power: AC 208 V, 3 Phase 2007 vintage.
TEL/TOKYO ELECTRON ACT 8是一款為光刻膠應用而設計的先進曝光設備。它是一種激光驅動系統,利用高分辨率和精確的曝光時間控制來減少遮罩缺陷,增加曝光的光刻膠圖像的一致性。這種光敏單元由激光源、調制器單元、掃描單元、分析儀單元和光敏圖像檢測器組成。激光源產生用於曝光光刻膠的光子。這可以是He-Cd,也可以是氙離子類型。調制器確保每個激光脈沖具有完全相同的持續時間,允許精確控制功率密度並提供均勻的10ns曝光。掃描機采用高精度、剛性的機械設計,對光刻膠進行精確曝光。它以1.2米/秒的速度掃描XY電機驅動級運行。分析儀使用CCD傳感器來確認光刻膠圖像的精確曝光。光致抗蝕劑圖像檢測器允許對極精確的抗蝕劑圖樣進行與偏轉無關的測量。它結合了測量階段、數據輸入控制單元和信號輸出顯示單元。它可以檢測到小至0.2微米的位置誤差。TEL ACT 8適用於半導體制造等多種行業。它使芯片制造商能夠快速、準確地生產分辨率更高的設備,並消除了掩模翻轉。這種先進的工具能夠達到0.1微米的打印精度。它還具有高速處理大型產品的能力,具有極好的資源利用率。
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