二手 TEL / TOKYO ELECTRON ACT 8 #9357239 待售

ID: 9357239
晶圓大小: 8"
優質的: 2001
Coater / Developer system, 8" Main frame with controller Carrier station: Type: Normal uni-cassette (4) Cassette stages Pickup cassette Coater: (3) Dispense nozzle with temperature controller for etcher RRC Pump Rinse nozzle: Back / EBR / Solvent bath for etch unit Rinse: (2) Buffer tanks: 3 Liter PR Suck-back valve Direct drain TARC Coater: (2) Dispense nozzle with temperature controller for etcher RRC Pump Rinse nozzle: Back / EBR / Solvent bath Rinse: (2) Buffer tanks: 3 Liters PR Suck-back valve Direct drain Developer: SH Nozzle (2) Stream nozzles for DI rinse (2) Buffer tanks: 3 Liters Temperature controller Direct drain (3) Adhesions: 100% Sealing closed chamber (Built-in hot plate) HMDS Tank with float sensor (15) Low Temperature Hot Plates (LHP) (14) Chill Plates (CPL) TCP Module (3) TRS Modules Wafer Edge Exposure (WEE) module: Wafer type: Notch, DUV Notch DUV Chemical cabinet 1: Solvent and developer Chemical cabinet 2: PR and HMDS (2) TEL OEM Temperature controllers AC Power box Interface Missing parts: 2-1 COT Spin I/O Board 2-4 COT EBR Nozzle tip 2-4 COT EBR Nozzle valve 2-1 Nozzle changer motor 3-2 Shutter cylinder (2) PRB YASUKAWA Spin motor drivers 2-0 PRA Z-Driver 3-0 PRA Z-Driver Temperature and humidity controller (For 4 chu) Hard Disk Drive (HDD) 2001 vintage.
TEL/TOKYO ELECTRON ACT 8是一種最先進的光敏設備。它旨在提供業界領先的光刻工藝精度和精確度。光刻是制造許多電子元件的關鍵一步。TEL ACT 8系統利用高精度掩模對準器將圖樣精確地傳遞到光刻材料上。圖樣以較高的速度和精度傳遞到基材上。TOKYO ELECTRON ACT 8具有強大的步進電機和專有的控制單元。這樣可以使掩模與基板快速而精確地對齊。掩模對準器的分辨率為25納米,提供了高精度和重復性。該機還能對面膜進行圖像處理,並能根據圖案的復雜性控制每一層的光劑量。ACT 8還配備了強大的潔凈室環境。空氣被過濾和控制到非常高的程度。這確保即使是最脆弱和微型的部件也不會受到任何汙染。清潔室還有助於控制濕度,這對於控制光刻膠的曝光率很重要。TOKYO ELECTRON ACT 8還配備了用於控制整個工具的高級軟件。該軟件能夠以各種模式控制光照。它還能夠控制基板和面膜的溫度,這對於控制光敏膠的收縮很重要。TEL/TOKYO ELECTRON ACT 8是一種高度靈活、精確的光致抗蝕劑資產。能夠生產高質量、高可重復性的零件。強大的電機和先進的軟件使得生產高吞吐量的精密零件成為可能。精密的環境控制確保即使是最精細的部件也不會受到汙染。該模型是為小部件的大批量生產而設計的。
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