二手 TEL / TOKYO ELECTRON Clean Track ACT 8 #9191941 待售
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ID: 9191941
晶圓大小: 8"
優質的: 2015
Photoresist processing system, 8"
Carrier station (CSB)
With 1 x 4 loader
Pick up stage
Coater unit (COT) for resist coating
Resist dispense line
With TEL HPT Resist pump (LOR 10A)
Adjustable suck-back valve
Resist consumption feature
Backside rinse
Programmable topside edge bead remover
Programmable dummy dispense
Direct drain
Yellow LED light module in spinner unit
PTI Active mass flow control
Polymide coater unit (PCT):
Pressurized dispense system for polymide:
Lit-lifting mechanism
With pressure sensor system
Backside rinse
Programmable topside edge bead remover
Programmable dummy dispense
Direct drain
Yellow LED light module in spinner unit
PTI Active mass flow control
Developer unit (DEV) for puddle develop
Super H nozzle (TMAH)
Top and backside rinse (DIW)
Yellow LED light module in spinner unit
Direct drain
Polyimide developer unit (PI DEV):
Spray nozzle set for spray develop (Cyclopentanon)
Straight nozzle for puddle develop (Cyclopentanon)
Spray nozzle set for spray rinse (PGMEA)
Top and backside rinse (PGMEA)
Yellow LED light module in spinner unit
Direct drain
Central Supply PCS (Pump chemical supply system) for Cyclopentanon
With two-canister auto-switch system
Central supply two-tank auto-supply system (PGMEA and TMAH)
Thermal units:
Chill plate process station (CPL)
Low temperature hot plate process station (LHP)
Heater cover hot plate process station (HCH)
Transition stage (TRS)
Transition chill plate (TCP)
Cup washer holder (CWH)
AC Power box: 208VAC
Thermostatic water supply unit
Side cabinet for polyimide & PGMEA Supply
Chemical cabinet for Cyclopentanon & TMAH supply
Cup temperature & humidity controller CP-2 (Coater & PI coater unit)
CE Marked
2015 vintage.
TEL/TOKYO ELECTRON Clean Track ACT 8是一款先進的光刻設備,旨在提供卓越的潔凈室性能和吞吐量。該系統采用一種自動跟蹤裝置,該裝置結合了主動清洗工藝和無化學物質的光刻晶片儲存和運輸。經過優化的抗蝕劑供應機器進一步確保了高生產率、高均勻性和最小晶圓汙染。TEL Clean Track ACT 8包括一個旨在抵抗顆粒沈積的敏感器工具。資產配備了多種功能以確保最佳性能。采用專門的塗層工藝,保證了光致抗蝕劑對晶片表面的優越附著力,保證了整個表面積的總覆蓋率和均勻的薄膜厚度。自動模型識別晶片的大小並標識指定的抗蝕劑類型。模塊化設備還具有靈活的容量,可以根據當前需求和晶圓尺寸進行即時調整。TOKYO ELECTRON CLEAN Track ACT 8的專有抵抗系統帶來了幾個優點。清潔液是一種水溶液,可最大限度地減少有機物質的引入,並在單位內按需產生。這確保進一步防止汙染。預編程的液體消耗率優化了機器的高速加工。抗蝕劑供應工具保持密封狀態,以保護暴露的抗蝕劑在任何時候都不受汙染。此外,Clean Track ACT 8還配備了若幹高級安全功能。內置的低壓抵抗噴霧資產降低了暴露於空氣中顆粒的風險,保護基片免受可能的汙染。該模型還設計用於清潔環境中的卓越性能,並擁有更窄的操作範圍,從0.2巴到0.6巴。TEL/TOKYO ELECTRON CLEAN Track ACT 8的獨特設計允許提高通量和最小晶圓汙染,實現包括矽、陶瓷和石英在內的多種基材的高產率。靈活的容量和自動化的流程使TEL Clean Track ACT 8成為清潔室操作的經濟高效的解決方案,而清潔室操作要求其光阻設備提供高性能。
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