二手 TEL / TOKYO ELECTRON Clean Track ACT 8 #9245118 待售

ID: 9245118
晶圓大小: 8"
優質的: 2002
(4) Coater / (4) Developer system, 8" (2) Chemical cabinets: Solvent and developer (2) SMC Thermo controllers: HMDS, PR YEST YIB-TP23 T and H Controller AC Power box MFC: 4-Ports Right to left Wafer type: Notch, DUV type DUV Type 25-Slots Loading configuration: (4) Loader uni-cassettes Carrier station: Type: Normal uni-cassette (4) Cassette stages Pick-up cassette Uni-cassette system Coater unit (2-1, 2-2, 2-3, 2-4 Module): (4) Dispense nozzles With temperature controlled lines RDS Pump Rinse nozzle: Back / EBR / Solvent bath Rinse system: 3 Liters (2) buffer tank systems PR Such-back valve type: AMC Suck-back valve Programmable side rinse Direct drain Developer unit (3-1, 3-2, 3-3, 3-4 Module): H Nozzle (2) Stream nozzles for DI rinse 2-Points for back side rinse / Unit Developer system: 3 Liters (2) buffer tank systems Developer temperature control system Direct drain (2) Adhesion units: 100% Sealing closed chamber (Built-in hot plate) HMDS Tank with float sensor Interface type: ASML (3) High temperature hot plates (15) Low temp hot plates (10) Chill plates (CPL) (4) Precision Hot Plate (PHP) process station (3) TRS Modules TCP Module Wafer Edge Exposure (WEE) module (2) TEL / TOKYO ELECTRON Temperature control units Main controller missing Power: AC 208 V, 3-Phase 2002 vintage.
TEL/TOKYO ELECTRON CLEAN Track ACT 8是一款完整的光刻設備,旨在提供高生產率、出色的叠加精度和卓越的重復性的精密光刻零件處理能力。該系統具有SIMOX工藝模塊,用於幹式抗蝕層開發,以及模塊化添加模塊,以滿足更大規模的晶圓和半導體加工需求。該單元設計為單層、單室工藝,可實現簡單、有效的抵抗處理。它具有一個精確控制的X-Y級,結合了一個創新的抵抗顯示器,以降低噪音和提高性能。這臺機器還采用了三重曝光處理模塊,它提供了改進的邊緣定義和邊緣精度,因為它應用了一系列具有可調間隔時間的曝光。該工具利用先進的工藝控制技術,以確保在低光敏消耗水平下的最大精度。其專有的La Ra Revolution流程監視器還實時監控運行情況,允許在需要時快速糾正解決方案。即使工藝條件不同,這也有助於確保結果的一致性。該資產還具有專有PROM(相片抵抗優化模塊)軟件,用於SEM窗口和OPC。此軟件可精確計算每種結構類型的最佳條件,從而使制造分辨率更高的部件的錯誤更少。該型號還通過靈活的設備配置和在幹凈的軌道上安裝增加了額外的便利。這使得它很容易適應一系列的生產需求。綜上所述,TEL Clean Track ACT 8是一個完整的光刻膠系統,為用戶提供出色的叠加精度和出色的重復性,同時提供簡單的安裝和靈活的單元定制。該機器提供先進的過程控制、改進的邊緣定義和軟件輔助零件優化,以提高分辨率,同時保持較低的光刻膠消耗水平。
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