二手 TEL / TOKYO ELECTRON Clean Track ACT 8 #9248792 待售

TEL / TOKYO ELECTRON Clean Track ACT 8
ID: 9248792
晶圓大小: 8"
優質的: 1999
(2) Coater / (2) Developer system, 8" Direction: Right to left (25) Slots (4) Uni-cassette loaders Main controller: Type 2 CSB PRB1 IFB Power box T&H Controller Chemical box Thermo controller Main system: Main frame with system controller Carrier station: Type: Normal uni-cassette (4) Cassette stages Pick-up cassette Uni-cassette system Coater unit (2-1, 2-2): (4) Dispense nozzles with temperature controlled lines for etch unit RRC Pump Rinse nozzle: Back / EBR / Solvent bath for etch unit Rinse system: 3 Liters (2) Tanks buffer tank system P.R Suck-back valve type: Air operation suck-back valve Programmable side rinse Drain: Direct drain Developer unit (2-3, 2-4): Steam nozzle for each unit (2) Stream nozzles for DI rinse and 2-points for back side rinse on each unit Developer system: 3 Liters (2) tanks buffer tank system Developer temperature control system Drain: Direct drain Interface type: ASML (8) Low temperature hot plates (LHP) (4) Chill plates (CPL) (4) Chilling hot plate process stations (CHP) TCP Module (2) TRS Modules WEE (wafer Edge Exposure) Module Wafer type: Notch Chemical cabinet TEL / TOKYO ELECTRON Temperature Control Unit (TCU) AC Power box Missing parts: 2-5, 2-17 ADH Module assemblies Circulator pump IRA T Axis motor driver WEE CCD Board WEE X Axis motor driver (2) 2-2 COT P.R Pumps (2) Developer buffer tanks 2-2 Spin chuck T&H Controller Main controller hard disk System power rating: AC 208V, 3-Phase 1999 vintage.
TEL/TOKYO ELECTRON CLEan Track ACT 8是一款用於半導體加工的先進光刻設備。它旨在在具有挑戰性的細線流程中提供卓越的性能,尤其是在高級14 nm及以下流程節點中。TEL Clean Track ACT 8能夠以高達8.4 m/s的速度運行,同時在整個基板表面保持均勻的層沈積。其先進的配電系統采用改良的液體門控技術(LGT),可確保整個晶片表面均勻沈積薄膜。LGT還可實現更小的死帶尺寸,同時提高流程吞吐量。TOKYO ELECTRON CLEAN TRACK ACT 8還有一個新的CozFlow Dispense Technology,它使用一個特殊的噴嘴來精確控制光刻膠的分配量和流動方向。這樣可以提高薄膜沈積的精度。使用可選的Clean Track Precision Point Laser Unit可以進一步提升Clean Track ACT 8的性能。這種專有激光機器在晶片表面上應用光刻膠薄膜的精度和均勻性得到了提高,這種光刻膠薄膜采用的是固態激光器,經過調整以獲得所需的抗蝕劑參數。從該工具獲得的結果優於傳統光學光刻技術。TEL/TOKYO ELECTRON CLEan Track ACT 8具有先進的自動化清洗資產,允許進行高對比度蝕刻工藝。這種清理模型旨在去除制造過程中使用的任何化學物質的殘留物,並為進一步加工準備晶片。TEL Clean Track ACT 8還擁有許多其他功能,使其成為高級半導體工藝的理想解決方案。其中包括:顯示晶圓制造進度的集成實時過程監視器、易於操作的觸摸屏,以及調整抗蝕膜寬度以適應所需圖案尺寸的能力。TOKYO ELECTRON Clean Track ACT 8的先進功能使其成為復雜而精確的半導體制造工藝的理想解決方案,特別是對於先進的14 nm及以下工藝節點。通過使用Clean Track ACT 8,工程師和技術人員能夠準確、統一地設計設計,同時實現一致的結果。
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