二手 TEL / TOKYO ELECTRON Clean Track Mark 8 #9158015 待售
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ID: 9158015
晶圓大小: 8"
優質的: 1997
(2) Coater / (3) Developer system, 8"
Dual block
Silicon substrate wafer
Wafer flow: Right to left
CSB Unit at right
Interface station unit at left
(2) Process blocks:
Cassette station block (CSB):
FC-9801F Controller
Stage / Indexer:
Non SMIF / Open uni-cassette
Cassette station (CS)
Cassette station arm (CSA)
PSB / Process station block (Spin units):
2-1 Standard photo resist coat unit:
(3) Photo resist dispense nozzles
(3) IWAKI Bellows pumps
Solvent pre-wet reduced resist coat (RRC) nozzle
Side rinse nozzle (Programmable side rinse EBR)
Dual back rinse nozzles
Photo resist temperature control
Motor flange temperature control
Photo resist drain type: Direct gravity drain type
(6) Photo resist bottles in external chemical supply systems
Photo resist auto exchange
Auto dummy dispense system
2-2 Bottom layer coat (BCT) unit:
(3) Bottom layer coat (BCT) dispense nozzles
(3) IWAKI Bellows photo resist pumps
Solvent pre-wet reduced resist coat (RRC) nozzle
Side rinse nozzle (Programmable side rinse EBR)
Dual back rinse nozzle
Photo resist temperature control
Motor flange temperature control
Photo resist drain type: Direct gravity drain type
Photo resist bottle: (6) External photo resist supply system
Photo resist auto exchange
Auto dummy dispense system
Process block robotics arm (PRA)
Adhesion unit (AD)
(5) Hot plate oven units
(2) Dehydration hot plate (DHP) oven units
(2) Cool plate units
Process station block (Spin units):
3-2, 3-3, 3-4 Develop units:
(4) Stream nozzles at (4) Stream nozzle blocks
Rinse nozzles:
(2) Stream type
Spray type
Dual back rinse nozzles
Develop temperature control
Motor flange temperature control
Drain type: Direct gravity drain type
Auto damper
Auto dummy dispense system
Process block robotics (PRA) Arm
Adhesion unit
(3) Hot plate oven units
Dehydration hot plate (DHP) oven unit
(3) Air-purge hot plate (AHP) oven units
(3) Cool plate units
Extension unit
Wafer edge exposure (WEE) unit
Interface station block (IFB):
Interface arm (IFA)
Interface for ASML PAS Series Stepper
(2) Buffers
Pick-up system
Interface cool
Extension stage
Wafer stage
Temperature and humidity controller:
TEAM KOREA TK-TH8T4
2-Cup control capacity for 2 Coat units
External chemical supply system:
Solvent supply system:
Solvent chemical type
CSS Bulk-fill to auto supply system
With (2) Buffer tanks: Auto switch-off / Exchange
Develop supply system:
Develop solution chemical type
CSS Bulk-fill to auto supply system
With (2) Buffer tanks: Auto switch-off / Exchange
Photo resist supply system for 2-1 Coat and 2-2 BCT
6-Bottles of manual supply type
Auto exchange system
HMDS Supply system:
HMDS Chemical type
CSS Bulk-fill to auto supply system with bubbling jar
HMDS Supply system
Themo controller:
External chemical supply system: (2) TEL / TOKYO ELECTRON SMC Multi controller
MAX 16 Channel capacity: 12-Channels for (2) Process
SMC Multi thermo controllers:
(6) SMC Circulators: Chilling channels
2-1 COT Unit
2-2 BCT Unit
Stream nozzle block:
Block 1 and 3: 3-2, 3-3 DEV
Block 2 and 4: 3-4 DEV
(5) Motor flanges
(6) SMC Thermo controllers: Chilling channels
2-9 COL
2-10 COL
3-7 COL
3-11 COL
3-15 COL
4-4 I/F COL
(4) Robots:
CS Arm
(2) Main arm robots
Interface arm
Power transformer AC cabinet: 208 VAC, 3-Phase, 50/60 Hz
1997 vintage.
TEL（TOKYO ELECTRON）TEL/TOKYO ELECTRON CLEan Track Mark 8是一款用於製造電路板的光敏設備。該系統能夠進行各種光刻過程，包括旋轉塗層、軟烘烤、面膜對準、噴塗和硬烘烤。幹凈的軌道可以實現可重復和準確的結果,從而幫助創造高產率。TEL Clean Track Mark 8旨在幫助減少清潔空間停機時間並提高工作效率。它具有耐用、可靠的防靜電底盤和「no-ccd」對齊單元,可將對齊時間縮短一半。此外，該機還配備了觸摸面板液晶顯示屏，這使得導航工具的功能更加容易。該資產包括兩種獨特和先進的烘烤技術，以提高清潔度和工藝精度。首先是分裂烘烤，將烘烤過程分成兩部分，降低汙染風險，優化溫度穩定性。二是混合烘烤，可以完全烘烤晶圓，而不會將基材分離成任務。TOKYO ELECTRON Clean Track Mark 8採用特別設計的噴嘴和清潔劑，能夠快速清除抗拒殘留物，導致更清潔的晶片，同時大幅減少化學廢棄物的產生。特殊的塗層功能可將化學用量和清潔時間減少70%之多,陶瓷頭噴嘴有助於減少總顆粒數量,而高精度的無接觸跟蹤有助於提高對準精度。此外，該模型是可改造的，它允許與各種光刻膠系統兼容。總體而言,Clean Track Mark 8使用先進技術,使用戶能夠獲得可重復和一流的結果,同時最大限度地減少化學品、能源和停機時間的使用。它被設計成一種高效的光敏設備，幫助用戶在保持成本效益的生產的同時達到最大產量。
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