二手 TEL / TOKYO ELECTRON Clean Track Mark 8 #9165442 待售
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ID: 9165442
晶圓大小: 8"
優質的: 1997
(2) Coater / (2) Developer system, 8"
Single block
Open cassette
Interface for NIKON NSR 2205 EX14C
Silicon substrate wafer
Wafer flow: Left to right
CSB Unit at right
Interface station unit at left
(2) Process blocks: Single block system
Cassette station block (CSB):
FC-9821KE Controller
Stage / Indexer:
Non SMIF / Open uni-cassette
Cassette station (CS)
Cassette station arm (CSA)
Process station block (Spin units):
2-1 Standard photo resist coat unit:
(3) Photo resist dispense nozzles
(3) IWAKI Bellows pumps
Solvent pre-wet reduced resist coat (RRC) nozzle
Side rinse nozzle (Programmable side rinse EBR)
Dual back rinse nozzles
Photo resist temperature control
Motor flange temperature control
Photo resist drain type: Direct gravity drain type
Auto dummy dispense system installed
Photo resist bottle: (6) External chemical supply system
2-2 Anti-reflection coat unit:
(3) Photo resist dispense nozzles
(3) IWAKI Bellows photo resist pumps
Solvent pre-wet reduced resist coat (RRC) nozzle
Side rinse nozzle (Programmable side rinse EBR)
Dual back rinse nozzles
Photo resist temperature control
Motor flange temperature control
Photo resist drain type: Direct gravity drain type
Auto dummy dispense system installed
Photo resist bottle: (6) External chemical supply system
2-3 and 2-4 Develop units:
(4) Stream nozzle blocks
(4) Stream nozzles
(2) Rinse nozzles: Stream type
Dual back rinse nozzles
Develop temperature control
Motor flange temperature control
Drain type: Direct gravity drain type
Auto damper
Auto dummy dispense system
Process block robotics arm (PRA)
Adhesion unit
(10) Hot plate oven units
(2) Air-purge hot plate (AHP) oven units
(7) Cool plate units
Wafer edge exposure (WEE) unit
Interface station block (IFB):
Interface arm (IFA)
(2) Buffers
Pick-up system
Interface cool
Extension stage
Wafer stage
Temperature and humidity controller:
SHINWA T&H-CPC
2-Cup control capacity for (2) Coat units
External chemical supply system:
Solvent supply system for (2-1) COT and (2-2) ARC:
Solvent chemical type
Bulk-fill central chemical supply (CSS) type
With (2) 3-Liter teflon buffer tanks
Develop supply system for 2-3 and 2-4 Develop units:
Develop solution chemical type
Bulk-fill central chemical supply (CSS) type
With (2) 3-Liter teflon buffer tanks
(2) Photo resist supply systems:
6-Bottles of manual supply type
Auto switch-off / Exchange installed
HMDS Supply system:
HMDS Chemical type
Bulk-fill central chemical supply (CSS) type
With 3-Liter teflon buffer tanks for AD unit
External chemical supply system / Cabinet: (2) SMC Multi thermo controller units
SMC Circulator pumps and thermo controller
With 7-Channels:
2-1 COT
2-2 ARC
Motor flanges: 2-1 COT and 2-2 ARC
2-8 COL
2-12 COL
2-16 COL
2-19 COL
SMC Circulator pumps and thermo controller
With 7-Channels:
1 and 3 Stream nozzle blocks: 2-3
2 and 4 Stream nozzle blocks: 2-4
(2) Motor flanges at 2-3 and 2-4 DEV
2-20 COL
2-23 COL
2-24 COL
3-4 I/F COL
(3) Robots:
CS Arm
Main arm robots
Interface arm
Power transformer AC cabinet: 208 VAC, 3-Phase, 50/60 Hz
1997 vintage.
TEL/TOKYO ELECTRON CLEAN Track Mark 8是為滿足當今超高可靠性和高精度電路板的要求而開發的光刻膠系統。Mark 8采用了先進的超聲波接觸清潔（UCC）方法，配備了兩步式的「吹氣清洗和掃描清洗」工藝。Airblow Cleaning process uses a high-speed air flow to remove dust, dust, and contains up at a some size.它利用強制氣流清潔表面，而不會對基板造成任何損害或應力。「掃描清潔」過程采用了使用旋轉刷子的往復式清潔方法。這將清除空氣吹掃過程後殘留的小汙染物。Mark 8還包含一些其他功能,以提高性能和輸出。其中包括使用特定密度清潔器（SDC）、CCD相機進行缺陷檢測、板室溫度控制、硬件和軟件警報監控、Shimura/Kitta缺陷檢測、自動化學水平控制和卷帶式芯片粘度控制。Mark 8還具有額外的靈活性和可定制的板基級,使其能夠處理高應變和低應變傳感器基板,以及標準化和非標準化基板。此外，該工具還集成了高度感應傳感器，從而減少了在加工過程中出現顆粒汙染的機會，並提高了性能。在當今高精度電路板時代,TEL Clean Track Mark 8光刻系統滿足了客戶的性能和可靠性需求。它具有先進的UCC功能和幾個附加功能,有助於為客戶提供一貫清潔、高質量的基板。憑借Mark 8的多功能性和高級功能,它能夠滿足最苛刻的要求,確保無與倫比的性能。
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