二手 TEL / TOKYO ELECTRON Clean Track Mark 8 #9392817 待售
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ID: 9392817
晶圓大小: 8"
優質的: 1995
(2) Coater / (2) Developer system, 8"
Dual blocks
Coater: (3) Nozzles
Developer: E2 Nozzle
Wafer flow: Right to left (CSB Unit right side and interface station left side)
Tank auto switch off / Exchange missing
Block 1:
FC-9821Ke Controller
Stage / Indexer: SMIF / Cassette station
Cassette Station Arm (CSA)
Block 2:
Normal photo resist coater 2-1, 2-2:
(2) Photoresist dispense nozzles per coat unit
(2) Photoresist dispense nozzles and 2-RRC Resist pump per coater
Side rinse nozzle (Programmable side rinse EBR) for normal coater
Dual back rinse nozzle
Photoresist temperature control
Motor flange temperature control
Photoresist drain type: Direct gravity
Photoresist bottle: 2-Space
Photoresist auto exchange
Auto dummy dispense system
Cup type: PP Upper cup and inner cup
Auto damper: Cylinder
Block 3:
Developer 3-1, 3-2 Unit:
Single E2 nozzle
Dual top rinse nozzles
Back rinse nozzles
Developer temperature control
Motor flange temperature control
Drain type: Direct gravity
Auto damper
Auto dummy dispense system
Cup type: Stainless steel for upper and PP for inner
(2) Low temperature ovens (LHP)
(4) Cool plate units
SHINWA Temperature and Humidity Controller (THC): 2-CUP
External chemical supply system:
Section-1: Solvent supply system
Solvent chemical type:
Chemical Center Supply System (CCSS)
With (2) of 3-litres teflon buffer tank
Type: (2) Buffer tanks (3litre/Tank, teflon) (2) Coaters
Tank auto switch off / Exchange
Section 2: Develop:
Develop chemical type
Chemical Center Supply System (CCSS)
With (2) of 3-litres teflon buffer tank to cover (2) DEV Units
Tank auto switch-off / Exchange
HMDS Supply system for 2 AD Unit:
Chemical type
1/4-Gal bottle
With 1L Buffer tank per ADH
SMC Multi controller: Rear mail body
Power transformer AC cabinet : 208 VAC, 3 Phase, 50/60 Hz
ASML
(6) Hot transfer plates: HP3-4 / HP3-5 / HP 3-7 / HP 3-8 / HP2-4 / HP 2-8
(5) Cold transfer plates: COL2-9 / COL2-10 / COL3-6 / COL3-9 / COL3-10
Does not include Hard Disk Drive (HDD)
Missing parts:
CSB Unit:
X, Y, Z Theta motor
Y, Z Motor driver
FFU
COAT 2-1:
EBR Cylinder
Spin chuck
RRC Pump
Spin motor driver
Spin connection board
VAC Sensor
(4) Solenoid valves
COAT 2-2:
EBR Cylinder
Spin chuck
RRC Pump
Spin motor driver
VAC Sensor
(11) Solenoid valves
DEV 3-1:
DEV Spin motor and driver
DI Rinse arm cylinder
Spin unit base assembly
DEV Cup
Spin chuck
Spin connection board
Solenoid valve mainfold
VAC Sensor
D.I Rinse flow meter
(4) Flow meter sensors
DEV 3-2:
DEV Spin motor and driver
DI Rinse arm cylinder
Spin unit base assembly
DEV Cup
Spin chuck
Spin connection board
VAC Sensor
IFB:
Arm assembly
(2) Trabot arms for ASML
Y, Z Motor driver
2-Block system:
FFU
Main arm assembly
Y, Z Motor driver
SIMF Card
TVME Card
(2) AD Units
HP Unit
Circulator pump
(10) DC Power fuses
3-Block system:
FFU
Main arm assembly
Y-Z Motor driver
TVME Card
(2) CP Units
(2) CPL Powers
(3) HP Units
Circulator pump
(10) DC Power fuses
WEE Lamp house
(2) Temperature and humidity controllers
1995 vintage.
TEL/TOKYO ELECTRON CLEan Track Mark 8是一種用於先進半導體器件制造的自動化光刻設備，由TEL開發制造。它是一個集成的高吞吐量系統,提供一致、高質量的生產過程,並提高了速度和準確性。該裝置配備了堅固、高效的清潔和塗層技術，旨在最大限度地減少顆粒產生和殘留。機器的核心是Clean Track chamber，設計用於將晶片固定到位，確保制造過程中的可重復性。該室采用先進的腔室清潔技術和等離子體處理、化學清潔和先進的塗層技術相結合，以減少顆粒和其他殘留物。Mark 8工具還配備了多種自動化功能，包括自動基板傳輸和處理、自動配方資產、自動基板驗證以及對每個處理過的基板進行自動數據記錄。該模型能夠高精度地處理不同的基材尺寸、基材類型和形狀。該設備還采用了先進的噴嘴設計，以利於光刻材料的最佳塗層和噴塗。此外，它還配備了先進的粒子檢測系統，以確保顆粒或其他殘留物含量高的底物不會進一步加工。TEL Clean Track Mark 8提供了一種低成本、高質量的光刻膠處理解決方案,適用於一系列不同的先進設備制造工藝。它的模塊化設計和組件實現了多功能性和成本效益。先進的氣流和濕度控制為光刻塗層提供了理想的環境，自動處理基板最大程度地減少了汙染。該系統還通過跟蹤基板加工的變化和記錄實時數據來實現工藝優化。
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