二手 TEL / TOKYO ELECTRON NS 300 #293614676 待售

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ID: 293614676
晶圓大小: 12"
優質的: 2006
Wafer scrubber, 12" Material: Silicon Utility outlet: Vertical downward Carrier station block Carrier stage height: 900 mm Wafer transport method: Robotics transport method (X, Y, Z, Θ) Sensor placement sensor Presence sensor Mapping sensor Wafer out sensor Load port: Bolts / Light Loader: FOUP Load port lockout pin: FEOL Load port indicator Operator access switch FOUP Type: (25) Wafers Kinematic coupling pin Clamp Fan Filter Unit (FFU) AMHS: SHINKO ELCTRIC OHT I/O Sensor ES Switch terminal block Carrier ID reader Alarm lamp: Red / Blue / Yellow / Green Direct drain Digital manometer exhaust monitor Does not include HDD Scrubber process station: Mechanical chuck Wafer holding method: 6-Pins edge contact method Wafer fixing method: 3-Points grip method Wafer sensor N2 Purge backside liquid contact prevention Acceleration: 100 to 1,000 rpm (100 rpm/s increment) Dual band monitor: Alarm rpm bandwidth, stop rpm bandwidth Alarm / Stop rpm setting range: ±0 to 1,000 rpm Process recipes: 1000 Recipe steps: 100 Process time setting: 0 to 999.9 sec/step (0.1 sec increment) Arm: Brush and spray PVA and PP Brush Atomized spray nozzle Flow range: 100 L/min Basic setting: 0.2 L/min (2) Side rinse nozzles ENTEGRIS DIW Filter Rinse nozzle purge method: Slow leak ULPA Filter Rotation speed: CH2-1, CH2-2: 0, 10 to 3,000 rpm (1 rpm increment) CH2-3, CH2-4: 0, 10 to 4,000 rpm (1 rpm increment) AC Power box: Round terminal for main breaker Voltage: 208 V Option: CCD Camera Spinner internal lighting 2006 vintage.
TEL/TOKYO ELECTRON NS 300晶圓和掩模洗滌器是一種可靠高效的工具,用於各個行業。TEL NS 300 Wafer&Mask Scrubber主要用於半導體制造及相關行業,為改進制造過程控制和產量提供更清潔的晶片和Mask。TOKYO ELECTRON NS300 Wafer&Mask Scrubber采用小巧、用戶友好的設計,在清潔受汙染和/或噴塗的晶片、石英面膜、玻璃板等方面非常有效。NS300 Wafer&Mask洗滌器采用120升搖動/洗滌器底部水箱設計,可調節速度以獲得最佳清潔效果。洗滌作用通過其旋轉攪拌板進行,從各個方向產生均勻的清潔。不僅磨砂裝置非常耐用,甚至能夠創建幹凈的表面,而且噪音水平也很安靜,完全符合法律規定的水平,因此適合大多數環境。TEL/TOKYO ELECTRON NS300 Wafer&Mask洗滌器配備了溫度控制設備和數字顯示溫度傳感器,使用戶能夠高效、準確地調節溫度。洗滌器還配有排水系統、多種不同清潔周期的自動超聲波清洗裝置、控制排水的自動排水控制機、溫度設定和溫度控制的精確控制工具。為了滿足各種平臺的需求,TOKYO ELECTRON NS 300 Wafer&Mask Scrubber還配備了大尺寸的傾斜窗、防振腿、可調空氣手槍和各種浸泡解決方案,因此用戶可以靈活地定制工藝以滿足其特定要求。總體而言,TEL NS300 Wafer&Mask Scrubber是一款功能強大、用戶友好且直觀的工具,可在生產過程中節省時間和金錢。其耐用的結構確保了NS 300晶片和掩模洗滌器能夠快速有效地清潔晶片和掩模,同時其溫度控制資產和精確控制模型進一步提高了工藝可靠性和性能。
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