二手 ASML PAS 5500 / 1100 #9219196 待售
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ID: 9219196
晶圓大小: 8"
ArF Scanner, 8"
193nm Lithography
Signal tower: Local
SPM Alignmet: Standard
Optical prealign mark sensor: Standard
Wafer type: Notch
FAT Attendance
Laser type: CYMER Laser
Extended exposure
IRIS Reticles, 6"
Cassette elevator position: 1 / 2
Wafer track interface: TEL Mark 5 / 7 / 8 / ACT8
SECS I / II Interface
Batch streaming: Advanced RMS
Tape streamer OCU-MK4
Single reticle SMIF handling
Sign all
Reticle SMIF pod tag reader: Stepper version
Metrology data interface
Reticle barcode reader 24 char
Extended exposure translation
ASF E-Chuck flatness qualification
ASF Application specific lensheet
CSR CSR4066 / CSR 4442 Various
Extended exposure
Hose / Cable set: 25m
Multiple exposure
Quasar: DOE ID13 MP4 30 Included
ASF Small marks
IOSc-3 Packages
PEP 1100
Dose mapper
ASF Improved TIS measurement
Key tool performance indicators:
Focal plane deviation [nm]: 98
Astigmatism [nm]: 68
Lens distortion measured 139 points / Field:
Non-correctable error [nm]
NCE X: 2.7
NCE Y: 1.7
Dynamic performance:
Moving standard deviation mean +3 sigma: 7.5
Moving average mean +3 sigma: 1.9
Focus & levelling:
Focus repeatability (3σ) [μm]: 0.021
Level-ling repeatability:
Rx (3σ) [μrad]: 1.02
Ry (3σ) [μrad]: 1.11
Overlay performance:
Stage repeatability:
X [nm]: 1.6
Y [nm]: 3.1
Single machine overlay: 99.7% (Worst case, from stable phase) [nm]
X - Maximum 99.7%: 7.7
Y - Maximum 99.7%: 7.3
Matched machine overlay (99.7%): 10.6
Material handling:
X Position (3σ) [μm]: 0.39
Y Position (3σ) [μm]: 1.92
Rotation θ (3σ) [μrad]: 18.21
Image quality control:
3σ Image sensor measurements:
Focus repeatability: 4.78
Image tilt repeatability (Rx): 0.23
Image tilt repeatability (Ry): 0.31
Translation repeatability: 0.69
Magnification repeatability: 0.03
Die rotation repeatability: 0.06
Reticle inspection systems IRIS option:
Size and position reproduciblity: 0.997
Position range / Size standard deviation: 0.997
Inspection time [s]: 140
Stray light:
Cleaning trigger: 3.22%
Tamis:
Z7: 0.592
Z8: 1.271
Z9: 0.29
Additional elements tool include:
Laser 4kHz: Upgraded source / CYMER 7600A Laser
IRIS: Reticle inspection system
IOSc 3+: Overlay improvement
Quasar:
Automated DOE exchanger
Metrology data interface
Hertz: 60 Hertz
Power: 208 V.
ASML PAS 5500和1100是用於半導體工業生產集成電路的晶圓步進器。ASML PAS 5500和1100是先進的曝光工具,利用垂直紫外線光束將半導體圖樣制作到矽晶片上的光阻上。PAS 5500和1100都是最新的掃描投影光刻系統，利用激光幹涉儀在叠加、可重復性和精度方面取得最佳效果。該系統的分辨率為0.3微米，數值孔徑（NA）為0.65。系統的一個特點是具有可變場尺寸的能力，能夠使梁形狀適應各種圖案和螺距尺寸。ASML PAS 5500和1100配備了百萬像素曝光頭，有助於實現不到10納米的分辨率。它還具有改進的浸入式光刻技術，在投影透鏡和晶圓之間填充液體。這增加了光的透射，導致更好的圖像形成。晶片步進器具有先進的伺服系統，允許快速移動和高精度曝光晶片。它還具有許多智能功能,如智能預對齊、高效邊緣對齊和高效陣列。此外,這些系統還具有較高的吞吐量和較低的擁有成本。該系統提供了一個具有高級自動化選項的直觀用戶界面,使操作變得輕松高效。它還支持遠程診斷,並提供基於Web的工具監控系統。ASML PAS 5500和1100是半導體行業中一些最先進的晶圓步進器，其分辨率高，曝光時間短，是制造亞微米器件的理想選擇。
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