二手 ASML PAS 5500 / 500 #9049994 待售
看起來這件物品已經賣了。檢查下面的類似產品或與我們聯系,我們經驗豐富的團隊將為您找到它。
單擊可縮放
已售出
ID: 9049994
Stepper with DNS tracks
Slit Uniformity
Operator:MSA Machine:XXXX Release:8.7.0 Date:09/05/2012 Time:18:01
Comment :
Measurement mode
Scanning : N
Start position : Leftside
Measurement settings
Fieldsize [mm] X : 26.000 Y : 11.940
Steps X : 11 Y : 51
Number of Pulses : 100
Pulse Frequency [Hz] : 1000
Pulse Energy [mJ] : 10.00
Miscellaneous
Apply REMA Window : Yes
Illumination Mode
Illumination Mode : Conventional
Numerical Aperture : 0.57
Sigma Outer : 0.750
Illumination mode name : conventional Version : 1.0.0
Uniformity Measurement Results
Uniformity [%] : 0.48
X-Tilt [%/field] : -1.08
Symmetrical error [%] : -0.14
Logfile : LI/LISU/waf.1225
Overall Average of
Ratio : 1.00 Standard Deviation : 0.00
Intensities Spot Sensor [mW/cm2] : 585.60 Standard Deviation : 1.90
Intensities Energy Sensor [mW/cm2] : 586.80 Standard Deviation : 0.17
Estimated Uniformity from measured data [%]
If corrected for actual tilt : 0.21
If corrected with gradient filter : 0.48
If corrected for tilt and with gradientfilter : 0.07
############################################################################
############################################################################
Slit Uniformity
Operator:MSA Machine:XXXX Release:8.7.0 Date:08/22/2012 Time:09:02
Comment : Annular
Measurement mode
Scanning : N
Start position : Leftside
Measurement settings
Fieldsize [mm] X : 26.000 Y : 11.940
Steps X : 11 Y : 51
Number of Pulses : 100
Pulse Frequency [Hz] : 1000
Pulse Energy [mJ] : 10.00
Miscellaneous
Apply REMA Window : Yes
Illumination Mode
Illumination Mode : Annular
Numerical Aperture : 0.57
Sigma Outer : 0.750 Inner : 0.450
Illumination mode name : annular Version : 1.0.0
Uniformity Measurement Results
Uniformity [%] : 0.90
X-Tilt [%/field] : -1.75
Symmetrical error [%] : -0.37
Logfile : LI/LISU/waf.1224
Overall Average of
Ratio : 1.00 Standard Deviation : 0.01
Intensities Spot Sensor [mW/cm2] : 605.13 Standard Deviation : 3.65
Intensities Energy Sensor [mW/cm2] : 606.53 Standard Deviation : 0.12
Estimated Uniformity from measured data [%]
If corrected for actual tilt : 0.42
If corrected with gradient filter : 0.81
If corrected for tilt and with gradientfilter : 0.08
############################################################################
############################################################################
Operator:MSA Machine:XXXX Release:8.7.0 Date:08/22/2012 Time:10:38
Uniformity Measurement
Comment :
Image Field Size [mm]
x : 26.0 y : 3.0 Diameter : 40.0
Steps
x : 11 y : 3
Measurement Type : Pulse Mode
Pulses : 100
Pulse Frequency [Hz] : 1000
Pulse Energy [mJ] : 10.00
Apply REMA Window : Yes
Load Reticle : N
Illumination Mode : Conventional
Numerical Aperture : 0.57
Sigma Outer : 0.750
Illumination mode name : conventional Version : 1.0.0
Uniformity Measurement Result
Uniformity [%] : 0.61
Logfile : LI/LIUM/waf.1443
Tilt X [%/field] : -0.91 Y [%/field] : -0.03
Overall Average of
Ratio : 1.00 Standard Deviation : 0.00
Intensities Spot Sensor [mW/cm2] : 586.44 Standard Deviation : 1.93
Intensities Energy Sensor [mW/cm2] : 587.55 Standard Deviation : 0.38
Estimated Uniformity from measured data [%]
If corrected for actual tilts : 0.37
If corrected with gradient filter : 0.45
If corrected for tilts and with gradientfilter : 0.26
Total Nr of Laserpulses since Installation [* 10^6] : 12454.98
Symmetric Uniformity Value [%] : 0.12
############################################################################
############################################################################
Scanning Dose Accuracy & Repeatability Test
Operator:MSA Machine:XXXX Release:8.7.0 Date:08/22/2012 Time:09:19
Comment :
Scanning : Y
Scan Direction : Forwards
Scan Type Settings : All scans SingleScan
Die size [mm] X : 2.000 Y : 5.000
Spot Sensor Coordinates on Die [mm] X : 0.000 Y : -2.000
Rema Mode : Die
Number of Repeats for each dose: : 100
Illumination Mode
Illumination Mode : Conventional
Numerical Aperture : 0.57
Sigma Outer : 0.750
Illumination mode name : conventional Version : 1.0.0
Dose Control Mode : High Performance Dose Control
Logfile : LI/LISA/waf.149
Result Table
+----------+-----------------------------------------+-------+--------+--------+
| | Recorded Exposure Energy Dose | | | |
| +----------+--------+----------+----------+ | | |
| Dose | Mean | Stddev | Min | Max |Repeat | Acc | Sum |
| [mJ/cm2] | [mJ/cm2] |[mJ/cm2]| [mJ/cm2] | [mJ/cm2] | [%] | [%] | [%] |
+==========+==========+========+==========+==========+=======+========+========+
| 5.00 | 5.09 | 0.00 | 5.08 | 5.10 | 0.24 | 1.77 | 2.00 |
| 10.00 | 10.21 | 0.01 | 10.19 | 10.23 | 0.22 | 2.07 | 2.29 |
| 20.00 | 20.31 | 0.01 | 20.28 | 20.35 | 0.18 | 1.56 | 1.74 |
| 30.00 | 30.39 | 0.01 | 30.35 | 30.44 | 0.14 | 1.32 | 1.46 |
| 40.00 | 40.54 | 0.02 | 40.50 | 40.59 | 0.11 | 1.35 | 1.45 |
| 50.00 | 50.57 | 0.02 | 50.52 | 50.62 | 0.10 | 1.14 | 1.24 |
| 100.00 | 101.04 | 0.05 | 100.93 | 101.16 | 0.11 | 1.04 | 1.15 |
| 150.00 | 151.39 | 0.08 | 151.27 | 151.55 | 0.09 | 0.93 | 1.02 |
+----------+----------+--------+----------+----------+-------+--------+--------+
Max. Repeatability [%] : 0.24
Min. Repeatability [%] : 0.09
Max. Accuracy [%] : 2.07
Min. Accuracy [%] : 0.93
Max. Sum [%] : 2.31
Min. Sum [%] : 1.02
############################################################################
############################################################################
==============================================================================
Dyn System Qual;Image Plane - ...ification/Dynamic/Single Energy/Model ; Dynamic
Operator:MSA Machine:XXXX Release:8.7.0 Date:11/21/2012 Time:11:27
Exposure conditions:
Exposure date and time : Sun Aug 19 11:46:56 2012
Machine ID : XXXX
Reticle ID : 45441782A019
Reticle Alignment : TTL Align
Lens type : 79
Temperature [degC]: 22.00
Pressure [mbar]: 1023.25
Illumination Mode : Conventional
Blade ID : Not Applicable
Numerical Aperture : 0.57
Sigma Inner : Not Applicable
Sigma Outer : 0.75
Lens ID : 0105624A
Focus Step [um]: 0.12
Focus Offset [um]: -0.90
Number of wafers : 2
Comments:
'Exposure': MPM
'Modelling':
Data File Name: XXXX_MPM8_081912
==============================================================================
Uncorrected values:
+----------------------------------------------------------+
| | Mean | Std. Dev. |
|==========================================================|
| Focus range [nm] | 148 | 20 |
| Raw astigmatism [nm] | 106 | 6 |
+----------------------------------------------------------+
Correctables:
+-------------------------------------------+
| Image offset [um] | 0.049 |
| Image tilt in x (Ry) [urad] | 0.195 |
| Element 1 height [um] | 0.722 |
| | |
| RS linear wedge [urad] | -0.546 |
| RS quadratic wedge [nm/cm2] | -3.749 |
+-------------------------------------------+
Result after corrections:
+----------------------------------------------------------+
| | Mean | Std. Dev. |
|==========================================================|
| Image plane deviation [nm] | 151 | 16 |
| Astigmatism [nm] | 106 | 7 |
+----------------------------------------------------------+
determined on 91 field positions.
############################################################################
############################################################################
Operator:MSA Machine:XXXX Release:8.7.0 Date:08/18/2010 Time:17:42
Focus Reproducibility
Measurements
Position : Wafer
Position X [mm] : 0.00 Y [mm] : 0.00
Number of measurements : 100
Output
Data Type : Full
Configuration
Reference Branch : Y
Fine p : Y q : Y
Window
Height [nm] Coarse : 250 Fine : 250
Tilt [urad] Rx : 100 Ry : 100
Absolute results
+---------+------------+------------+------------+------------+
| | Z | Rx | Ry | TotZ |
| | [um] | [urad] | [urad] | [um] |
+=========+============+============+============+============+
| Avg | -9.7701 | -39.8370 | -38.0575 | -10.5218 |
| Max | -9.7515 | -38.2445 | -36.3055 | -10.4992 |
| Min | -9.7916 | -42.0147 | -39.8978 | -10.5497 |
| Max-Min | 0.0401 | 3.7701 | 3.5923 | 0.0504 |
| Stddev | 0.0079 | 0.6756 | 0.7289 | 0.0125 |
+---------+------------+------------+------------+------------+
Relative results (to average)
+---------+------------+------------+------------+------------+
| | Z | Rx | Ry | TotZ |
| | [um] | [urad] | [urad] | [um] |
+=========+============+============+============+============+
| Avg | 0.0000 | 0.0000 | 0.0000 | 0.0000 |
| Max | 0.0186 | 1.5925 | 1.7521 | 0.0225 |
| Min | -0.0216 | -2.1776 | -1.8402 | -0.0279 |
+---------+------------+------------+------------+------------+
Termination Status
terminated : Normally
error count : 0
Measured data (Absolute)
+------------+------------+------------+------------+
| Z | Rx | Ry | TotZ |
| [um] | [urad] | [urad] | [um] |
+============+============+============+============+
| -9.7655 | -40.5165 | -36.9648 | -10.5074 |
| -9.7800 | -39.5127 | -37.1097 | -10.5173 |
| -9.7769 | -39.7916 | -38.9125 | -10.5394 |
| -9.7790 | -40.3539 | -38.2437 | -10.5364 |
| -9.7785 | -39.5528 | -38.7713 | -10.5377 |
| -9.7649 | -40.4179 | -37.2816 | -10.5102 |
| -9.7732 | -42.0147 | -36.8241 | -10.5229 |
| -9.7821 | -39.0658 | -38.4235 | -10.5336 |
| -9.7652 | -39.7742 | -37.5021 | -10.5093 |
| -9.7684 | -39.3748 | -37.6588 | -10.5119 |
| -9.7652 | -39.5564 | -36.9409 | -10.5006 |
| -9.7634 | -40.8306 | -37.7038 | -10.5169 |
| -9.7515 | -40.6355 | -37.3565 | -10.4992 |
| -9.7603 | -40.2630 | -37.1124 | -10.5025 |
| -9.7786 | -39.3249 | -37.7339 | -10.5227 |
| -9.7643 | -40.6762 | -37.9644 | -10.5202 |
| -9.7675 | -40.4179 | -37.3377 | -10.5136 |
| -9.7776 | -38.8425 | -38.0860 | -10.5232 |
| -9.7718 | -40.2938 | -37.3000 | -10.5166 |
| -9.7681 | -40.0046 | -38.3063 | -10.5241 |
| -9.7748 | -39.3195 | -36.3055 | -10.5004 |
| -9.7667 | -40.5930 | -38.2534 | -10.5258 |
| -9.7868 | -39.8798 | -38.2696 | -10.5415 |
| -9.7745 | -39.9436 | -38.9972 | -10.5391 |
| -9.7645 | -39.8327 | -39.0892 | -10.5296 |
| -9.7701 | -40.2804 | -36.7024 | -10.5070 |
| -9.7814 | -40.2261 | -37.8231 | -10.5325 |
| -9.7794 | -39.8133 | -39.0155 | -10.5434 |
| -9.7750 | -39.0829 | -39.1232 | -10.5357 |
| -9.7797 | -40.6502 | -37.6666 | -10.5315 |
| -9.7672 | -40.4168 | -36.7030 | -10.5050 |
| -9.7761 | -39.1525 | -38.2369 | -10.5258 |
| -9.7870 | -39.0503 | -38.4891 | -10.5392 |
| -9.7577 | -41.1639 | -36.8837 | -10.5027 |
| -9.7570 | -41.1076 | -38.2929 | -10.5199 |
| -9.7714 | -40.7037 | -37.9743 | -10.5276 |
| -9.7568 | -39.8498 | -38.0060 | -10.5080 |
| -9.7710 | -39.3692 | -39.7966 | -10.5423 |
| -9.7646 | -39.8609 | -37.4839 | -10.5090 |
| -9.7721 | -39.6824 | -38.3422 | -10.5265 |
| -9.7604 | -39.2479 | -37.4802 | -10.5008 |
| -9.7536 | -39.2437 | -38.4132 | -10.5061 |
| -9.7657 | -40.2048 | -37.6258 | -10.5141 |
| -9.7762 | -39.6844 | -37.8291 | -10.5239 |
| -9.7702 | -38.8947 | -37.6470 | -10.5105 |
| -9.7612 | -40.1875 | -38.2415 | -10.5176 |
| -9.7792 | -39.8850 | -37.5037 | -10.5240 |
| -9.7729 | -39.1850 | -37.2381 | -10.5098 |
| -9.7613 | -40.7197 | -37.9457 | -10.5173 |
| -9.7705 | -39.9194 | -39.2022 | -10.5376 |
| -9.7564 | -38.9419 | -39.4759 | -10.5207 |
| -9.7694 | -39.1124 | -39.8978 | -10.5404 |
| -9.7720 | -39.1279 | -38.2178 | -10.5212 |
| -9.7916 | -39.8522 | -38.5405 | -10.5497 |
| -9.7741 | -40.0793 | -38.6619 | -10.5352 |
| -9.7691 | -39.9331 | -38.1660 | -10.5228 |
| -9.7792 | -40.3889 | -38.7946 | -10.5440 |
| -9.7717 | -39.1853 | -37.4060 | -10.5107 |
| -9.7745 | -40.9147 | -38.2744 | -10.5360 |
| -9.7732 | -39.6131 | -37.6885 | -10.5187 |
| -9.7787 | -39.9724 | -37.8588 | -10.5287 |
| -9.7762 | -40.0535 | -38.1205 | -10.5301 |
| -9.7629 | -40.5288 | -36.8900 | -10.5039 |
| -9.7702 | -39.5173 | -37.6971 | -10.5151 |
| -9.7761 | -39.9947 | -38.1668 | -10.5303 |
| -9.7680 | -38.8518 | -37.8147 | -10.5102 |
| -9.7658 | -39.8365 | -37.7452 | -10.5134 |
| -9.7689 | -40.1078 | -37.1308 | -10.5103 |
| -9.7742 | -39.4813 | -38.4813 | -10.5291 |
| -9.7727 | -39.9902 | -37.2798 | -10.5153 |
| -9.7634 | -39.8633 | -37.0637 | -10.5023 |
| -9.7711 | -38.2445 | -37.7369 | -10.5083 |
| -9.7732 | -40.2596 | -37.2719 | -10.5174 |
| -9.7761 | -40.3531 | -37.6834 | -10.5262 |
| -9.7766 | -40.0425 | -38.9605 | -10.5413 |
| -9.7674 | -39.8253 | -38.4360 | -10.5239 |
| -9.7772 | -39.5769 | -38.3233 | -10.5307 |
| -9.7698 | -38.7025 | -39.2795 | -10.5301 |
| -9.7688 | -38.7997 | -38.1785 | -10.5153 |
| -9.7768 | -39.4022 | -37.5756 | -10.5194 |
| -9.7820 | -39.3415 | -38.4344 | -10.5354 |
| -9.7578 | -39.4880 | -38.3495 | -10.5110 |
| -9.7767 | -39.9885 | -38.1482 | -10.5306 |
| -9.7615 | -39.7493 | -39.0979 | -10.5262 |
| -9.7602 | -39.8560 | -38.0996 | -10.5126 |
| -9.7674 | -39.6038 | -39.2936 | -10.5336 |
| -9.7559 | -39.3433 | -38.7500 | -10.5134 |
| -9.7652 | -40.7314 | -37.6660 | -10.5176 |
| -9.7556 | -39.0180 | -38.6828 | -10.5101 |
| -9.7736 | -38.5990 | -38.6164 | -10.5246 |
| -9.7659 | -40.0684 | -37.5131 | -10.5120 |
| -9.7717 | -40.3805 | -39.0647 | -10.5400 |
| -9.7767 | -40.0894 | -39.2315 | -10.5453 |
| -9.7738 | -39.3731 | -38.5647 | -10.5291 |
| -9.7687 | -39.5713 | -38.4534 | -10.5238 |
| -9.7522 | -38.9775 | -38.4677 | -10.5037 |
| -9.7614 | -41.1591 | -37.7801 | -10.5180 |
| -9.7636 | -41.2565 | -38.6489 | -10.5321 |
| -9.7665 | -38.2850 | -37.7461 | -10.5041 |
| -9.7770 | -39.8987 | -38.2130 | -10.5312 |
+------------+------------+------------+------------+
############################################################################
############################################################################
Dynamic System Qualification ; Distortion - ...ification/Dynamic/Model ; Dynamic
Operator:ASM Machine:4418 Release:8.8.6 Date:11/26/2012 Time:11:19
System Qualification
Exposure Layer : --- First ---
Date/Time : Sun Aug 19 10:59:23 2012
Machine ID : XXXX
Reticle ID : 45443171A103
Reference Grid :
Matching set ID : NOMINAL
Reticle Alignment : TTL Align
Wafer Alignment : TTL Align
Lens Type : 79
Lens ID : 0105624A
Energy [mJ/cm2] : 33.0
Focus Offset [um] : 0.00
Illumination Mode : Conventional
Blade ID :
Numerical Aperture : 0.57
Sigma Inner :
Sigma Outer : 0.75
Temperature [degC] : 22.0
Pressure [mbar] : 1023.4
Wavelength [nm] : 248.281
Comments from:
'Exposure First Layer' : MPM
'Measure Mark Positions' :
'XY-Imaging Modelling' :
Test Log Name : XYD_XXXX_MPM8_081912.tlg
Optimization Method : Least-Squares
Number of Wafers : 1
Number of Rejected Wafers : 0
Number of Fields per Wafer : 12
Number of Marks per Field : 49
Alignment Errors in Data : 0
Max Field Size X [mm] : 26.0
Y [mm] : 33.0
Wafer/Field/Mark Selection : *:*:*
Align. Errors in Selection : 0
Overlay Mode : First to Nominal
Set Threshold : OFF
Reticle data used : Reticle data from testlog
Reticle layout used : 4X_SU_DYNA_7X7
==============================================================================
Uncorrected values:
+----------------------------------+---------+---------+
| | Mean |Std. Dev.|
| | [nm] | [nm] |
+==================================+=========+=========+
| max. image displacement x | 38.0 | 4.5 |
| max. image displacement y | 37.5 | 7.4 |
+----------------------------------+---------+---------+
Correctables:
+------------------------------+----------+----------+
| | Mean |Std. Dev. |
+==============================+==========+==========+
| RS height [um] | -0.072 | 1.431 |
| RS tilt in x (Ry) [urad] | 216.176 | 32.303 |
| Element 2 height [um] | 0.060 | 0.109 |
| Translation in X [um] | 0.019 | 0.006 |
| Translation in Y [um] | -0.004 | 0.005 |
| Lens rotation [urad] | 0.157 | 0.116 |
| Scan skew [urad] | 0.118 | 0.048 |
| Scan scale [ppm] | 0.225 | 0.200 |
+------------------------------+----------+----------+
Result after corrections:
+----------------------------------+---------+---------+
| | Mean |Std. Dev.|
| | [nm] | [nm] |
+==================================+=========+=========+
| image distortion (NCE) x | 17.2 | 6.7 |
| image distortion (NCE) y | 27.7 | 4.8 |
+----------------------------------+---------+---------+
############################################################################
############################################################################
Model - ...ogy Verification/Overlay/Wafer Stage Accuracy/Dynamic/Single Velocity
Operator:MSA Machine:XXXX Release:8.7.0 Date:05/06/2012 Time:07:12
Wafer Stage Accuracy
Exposure Layer : --- First ---
Date/Time : Sat May 5 17:30:29 2012
Machine ID : XXXX
Reticle ID : 45443171A103
Reference Grid :
Matching set ID : NOMINAL
Reticle Alignment : TTL Align
Wafer Alignment : No Align
Lens Type : 79
Lens ID : 0105624A
Energy [mJ/cm2] : 33.0
Focus Offset [um] : 0.00
Illumination Mode : Conventional
Blade ID :
Numerical Aperture : 0.57
Sigma Inner :
Sigma Outer : 0.75
Temperature [degC] : 22.0
Pressure [mbar] : 1026.9
Wavelength [nm] : 248.278
Comments from:
'Exposure First Layer' : after hp laser replacement
'Measure Mark Positions' :
'XY-Imaging Modelling' :
Test Log Name : XYW_SA_050512.tlg
Optimization Method : Least-Squares
Number of Wafers Measured : 1
Number of Fields per Wafer : 20
Number of Marks per Field : 25
Alignment Errors in Data : 0
Max Field Size X [mm] : 26.0
Y [mm] : 33.0
Wafer/Field/Mark Selection : *:*:*
Align. Errors in Selection : 0
Overlay Mode : Second to First
Set Threshold : OFF
Reticle data used : Reticle data from testlog
==============================================================================
Overlay Error for this Batch:
+------------------+-----------------------------+
| | Filtered Overlay Error |
| +---------+---------+---------+
| | X | Y | Vector |
| | [nm] | [nm] | [nm] |
+==================+=========+=========+=========+
| Mean | -1 | -1 | |
| St. Dev. | 2 | 2 | |
| |Mean| + 3 Sigma | 7 | 7 | |
| Maximum 99.7% | 7 | 7 | 8 |
+------------------+---------+---------+---------+
Intrafield Overlay Error Classification:
+------------------------------+---------------------+---------------------+
| | Model Parameters |Max. Resulting Errors|
| +----------+----------+----------+----------+
| | Mean |Std. Dev. | Mean |Std. Dev. |
| | | | [nm] | [nm] |
+==============================+==========+==========+==========+==========+
| Translation in X [um] | -0.001 | 0.001 | -1 | 1 |
| Translation in Y [um] | -0.001 | 0.002 | -1 | 2 |
| Rotation [urad] | -0.008 | 0.066 | -0 | 1 |
| Magnification [ppm] | -0.029 | 0.086 | -1 | 2 |
| 3rd Order Dist. [nm/cm3] | 0.266 | 1.537 | 1 | 3 |
| Trapezoid in X [um/cm2] | | | | |
| Trapezoid in Y [um/cm2] | | | | |
| 4th Ord. Trap. X [um/cm4] | | | | |
| 4th Ord. Trap. Y [um/cm4] | | | | |
| Asymm. Rotation [um] | 0.009 | 0.062 | 0 | 1 |
| Asymm. Magnification [ppm] | -0.003 | 0.108 | -0 | 2 |
+------------------------------+----------+----------+----------+----------+
Residuals for this batch:
+--------------------+---------+
| | Value |
+====================+=========+
| Residual X [nm] | 1 |
| Residual Y [nm] | 1 |
+--------------------+---------+
Wafer Stage Classification:
+---------------------------+---------+---------+---------+
| | X | Y | Vector |
| | [nm] | [nm] | [nm] |
+===========================+=========+=========+=========+
| Stage Repeatability | 3 | 4 | |
| Stage Accuracy | 7 | 7 | 8 |
+---------------------------+---------+---------+---------+
############################################################################
############################################################################
Model - Metrology Calibration/Machine Matching/Intrafield
Operator:MSA Machine:XXXX Release:8.7.0 Date:09/22/2012 Time:08:52
Machine to Machine Matching
Exposure Layer : --- First --- : --- Second ---
Date/Time : Thu Oct 26 10:52:45 2000 : Sat Sep 22 08:16:35 2012
Machine ID : XXXX : XXXX
Reticle ID : 45441181A015 : 45441181A015
Reference Grid : :
Matching set ID : DEFAULT : ORIGINAL
Reticle Alignment : TTL Align : TTL Align
Wafer Alignment : TTL Align : TTL Align
Lens Type : 79 : 79
Lens ID : 0105624A : 0105624A
Energy [mJ/cm2] : 30.0 : 33.0
Focus Offset [um] : 0.00 : 0.00
Illumination Mode : Default : Conventional
Blade ID : :
Numerical Aperture : 0.57 : 0.57
Sigma Inner : 0.00 :
Sigma Outer : 0.75 : 0.75
Temperature [degC] : 22.0 : 22.0
Pressure [mbar] : 1014.1 : 1021.8
Wavelength [nm] : 248.288 : 248.282
Comments from:
'Exposure First Layer' :
'Exposure Second Layer' :
'Measure Mark Positions' : WPM
'XY-Imaging Modelling' :
Test Log Name : XYM_zmatchbcf09222012.tlg
Optimization Method : Least-Squares
Number of Wafers Measured : 1
Number of Fields per Wafer : 16
Number of Marks per Field : 17
Alignment Errors in Data : 0
Max Field Size X [mm] : 26.0
Y [mm] : 33.0
Wafer/Field/Mark Selection : *:*:*
Align. Errors in Selection : 0
Overlay Mode : Second to First
Set Threshold : OFF
Reticle data used : Reticle data from testlog
==============================================================================
Overlay Error for this Batch:
+------------------+-----------------------------+
| | Filtered Overlay Error |
| +---------+---------+---------+
| | X | Y | Vector |
| | [nm] | [nm] | [nm] |
+==================+=========+=========+=========+
| Mean | 0 | 0 | |
| St. Dev. | 5 | 6 | |
| |Mean| + 3 Sigma | 14 | 18 | |
| Maximum 99.7% | 14 | 21 | 24 |
+------------------+---------+---------+---------+
Maximum Overlay Error positions for this Batch:
+------+---------+---------+---------+-------------------------------+
| | | | |Corresponding Position in Field|
| | | | +---------------+---------------+
| Nr | Max DX | Stdev | DY | X | Y |
| | [nm] | [nm] | [nm] | [mm] | [mm] |
+======+=========+=========+=========+===============+===============+
| 1 | 6 | 3 | 2 | 0.000 | -10.800 |
| 2 | 5 | 4 | 2 | 10.800 | 0.000 |
| 3 | 4 | 4 | 1 | 0.000 | -6.480 |
| 4 | 4 | 2 | 2 | -10.800 | 0.000 |
| 5 | 3 | 5 | 1 | -6.480 | 6.480 |
| 6 | 3 | 6 | 1 | 10.800 | 10.800 |
| 7 | 3 | 5 | 3 | 0.000 |
ASML PAS 5500/500是用於半導體工業制造集成電路的晶圓步進器。它使用激光器以光刻方式定義基板上的特征。該設備高度精確,能夠對寬度高達0.2微米的特征進行成像。它建立在剛性框架上,以確保最小的失真和振動,使其適合精確成像應用。該系統采用了F2激光源,其性能優於傳統的氙離子激光源。它提供了一個均勻的光束,使成像更加精確。激光借助鏡子和透鏡的光路耦合到單元中,用光機快門控制晶圓的曝光。該機器采用了視頻投影對準工具(VPAS),以提高光學對準的精度。此資產使用晶圓上網格模式的投影。對準傳感器檢測晶片的位置和傾斜度,以最大程度地減少誤差。PAS 5500/500也使用兩種類型的噴射器來精確定位晶圓和光學元件。機械噴射器用於較大的步驟,而壓電噴射器用於較小的步驟。噴射器與電動旋轉級相結合,可確保精確的旋轉運動.ASML PAS 5500/500使用線性驅動器模型在XY方向上移動。它由位置編碼器、電機和步進電機組成。該設備還具有幾個光學元件,可協助成像過程。這些包括顯微鏡、反射鏡、虹膜和冷凝器。該系統在成像過程中采用了定義明確的步進算法。這包括設置曝光時間、劑量和重復計數。重復計數確定陣列在晶圓上成像的次數。此功能與掃描結束識別單元一起,可實現精確的成像和優化的吞吐量。該機器與自動創建光掩碼(APC)軟件集成在一起,可幫助進行掩碼生成過程。它包括掩碼對齊、模具配準和OPC等功能。總體而言,PAS 5500/500是一種用於半導體制造的高度精確和自動化的晶圓步進工具。它利用F2激光源、用於光學對準的VPAS和APC軟件等高級功能來實現卓越的成像性能。
還沒有評論