二手 GCA 6800 #182892 待售

G-line Stepper Manual load of reticle Paddle wafer loader 6" x 6" X/Y stage motions Stage controlled motions with data input of 0.1μ in metric mode Stage precision of +/- 0.15μ Stage orthogonality ( software correctable) of +/- 0.5 arc sec Die rotation of +/- 0.2μ over 11mm Lens reduction of +/- 0.2μ over 11 mm Trapezoidal error of +/- 0.2μ over 11mm System is fitted with a Tropel 2035 5X g-line (436) lens with a .35NA and a 20mm dia. field. Lens spec. for this lens is 1.0 microns on ultra-flat wafers, but can be pushed lower Mercury light source will have a Maximus 1000 power supply and illuminator corrected for 436 nm (g-line) Auto focus in Z axis All electronic cards will be upgraded to latest available revisions Reticle loading will be manual type and will use a 5x5 inch reticle Wafer Handling will be done using a paddle system with paddles for 100 mm dia. wafers and pieces Wafer alignment (global) will be upgraded to a CCD camera Global objective spacing will be set for 76.2 mm separation Global Alignment system Registration of +/- 0.35μm The system uses a DEC PDP-11 computer An environmental water cooled chamber to be supplied with the uni Chamber power will be set for 208 volts, 60 Hz, 3 phase 30 amps, and the Electronic rack is 110volts, 60Hz, 30 amps.