二手 NIKON NSR 1505 G6E #9276476 待售

Stepper, 6" Lens resolution: 0.70 µm Lens distortion: ±100 nm Magnification error included Open flame: Maximum exposure area: Square 15 mm Vertical x horizontal: 17.5 mm x 12.5 mm Focus check: ≤ ±0.3 µm Lamp power: 500 mW/cm² Lamp uniformity: 3.0% Dose controll accuracy: ±1.0% Integrated exposure stability Reticle blind: 0.4- 0.8 mm Reticle rotation accuracy: 0.03 µm Target value repeatability: 0.02 µm LSA Telecen: ≤ ±0.5 µm LSA Repeatability: ≤ 0.2 µm Overlay: ≤ ±0.15 µm Stepping accuracy: 3σ ≤ 90 nm Wafer stage flatness: 3.0 µm / 150 mm Chip leveling: ≤ 0.4 µm (10 mm) Wafer transfer: Failure / (4) Lots wafer Prealignment2 Repeatability: 3σ 15 µm Wafer: Flat type Reticle size, 5" Wafer loader (2) Cassette tables Ceramic arm Reticle loader: PPD Reticle, 5" Automatic Reticle Loader (ARL) Wafer stage Leveling stage: X, Y, Z, T Chip leveling Wafer holder: Ring type, 6" Illumination: Lens type: 0.54 Maximum expose area: 15 mm square to 12.5(H) mm x 17.5(V) mm Reduction ratio: 5x Lamp power supply unit Alignment Laser power supply: WGA and LSA Alignment method: WGA and LSA Systems: MCS2 Floppy drive for storage Environment chamber.