二手 NIKON NSR 2205 i11D #9245445 待售

Stepper, 8" Basic version: MCSV Basic: 2.10A Option version: OCS Main system: 2020A Main computer: Vax 4000 96 Hard Disk Drive & storage drive included Illumination type: No shrinc Wafer stage: Chuck type: 4" (PSS) Screw type: Ball Reticle alignment: VRA & ISS Reticle microscope: Fix Auto focus: Multipoint Wafer loader: Wafer size: 4" Loader type: Single OF Type: Flat Flat zone: Flat In-line: Left Cassette: Center & right Control rack position: Right (6) Reticle loaders No extend library 13 Slot No PPD No barcode system Chamber type: ASAHI Lens data: Long term focus stability: Within 0.25 um Magnification control vs. & lens heat focus Div.: Mag: ≤ 0.02 um Focus: ≤ 0.2 um Auto focus repeatability: ± 0.1 um Focus calibration 2 repeatability: 3δ ≤0.10 um Lens distortion (Including magnification): Within ± 0.055 um Lens stability: Within ± 0.050 um Reticle blind setting accuracy: + 0.4 to + 0.8 mm (On reticle) Exposure power: 650 mW/cm² Intergrated exposure control: Within ± 1.0% Illumination uniformity: Within 2.5% Reticle rotation: Abs & Rep within 20 nm Array orthogonality: Within ± 0.1 sec Stepping precision: Within 0.05 um (3δ) Alignment accuracy: LSA: |X| + 3δ < 0.075 um (Center position) FIA: |X| + 3δ < 0.075 um (Center position) Stepping rate: < 20 Sec (4" Base) Wafer Pre-alignment 2 repeatability: 3δ < 25 um Throughput with Pre-alignment 2: LSA: EGA ≥ 50 Wafer / hr FIA: EGA ≥ 50 Wafer / hr System throughput: Within 83.7 sec / Wafer (4" Base) Chip leveling accuracy: Within ± 1.5 sec Chip leveling control time: Angle at 10 sec within 280 msec Angle at 30 sec within 610 msec Angle at 50 sec within 940 msec Operation test: Wafer system: > 99% Reticle: > 100% 1994 vintage.