二手 NIKON NSR 2205 i12C #293603489 待售
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ID: 293603489
i-Line stepper
Lens distortion: Standard measurement
Reticle blind setting accuracy
Focus calibration repeatability: 20 times measurement
Exposure power (N.A=0.57): Mercury lamp
Integrated exposure control accuracy (N.A=0.57): i-line IR-Radiance meter
Alignment accuracy FIA: FIA-EGA (Standard measurement)
Alignment accuracy LSA: LSA-EGA (Standard measurement)
Array orthogonality: Standard measurement
Stepping precision: Standard measurement
Wafer pre-alingnment repeatability: Single wafer, 20 times measurement
Illumination uniformity (N.A=0.57): 5 times measurement within the exposure area
Resolution, 0.4 µm:
L/S Conv NA: 0.57
CE V/H: 0.40
PR Film thickness: <1.0 µm
DOF: 0.45 µm:
5-Points V/H: 0.40 µm
PR Film thickness: <1.0 µm
CD Uniformity, 0.45 µm:
5-Points V/H: 0.40 µm
PR Film thickness: <1.0 µm
Coma, 0.45 µm:
5-Points V/H: 0.40 µm
PR Film thickness: <1.0 µm
Total Focus Deviation (TFD), 0.45 µm:
L/S Conv N.A: 0.57
Standard measurement
Astigmatism (AST):
Deviation L/S Conv
Standard measurement
Lens inclination, 0.50 µm:
L/S Conv N.A: 0.57
Standard measurement
Lens control accuracy (Initial):
Heating: 150 min
Cooling: 180 min
Operation test:
Wafer system
Reticle.
NIKON NSR 2205 i12C是用於精確高效制造半導體芯片的十二步晶圓步進器。它配備了內置的激光對準設備,允許以最少的時間和材料浪費進行高精度芯片制造。步進器特別適合生產需要高精度的芯片,例如用於光學或針腳柵格陣列設備的芯片。該設備具有高能效設計和高吞吐量能力,因此能夠快速生產高質量的芯片。激光對準系統進一步加快了過程,無需手動調整晶圓對準。這樣可以加快芯片生產速度,避免需要額外的處理步驟來確保高質量的最終產品。步進器具有先進的發光光學單元,分辨率為0.25微米,允許生產緊密的線狀特征和生產具有階梯狀表面等先進三維特征的芯片。光機連接到先進的主計算機和精密電機驅動器,保證了高精度芯片的生產。步進進一步配備了先進的交聯設計,即使在處理不同的抗性配方時也提供了前所未有的精度水平。通過允許步進器同時精確處理不同配方,生產時間最小化。總體而言,NIKON NSR-2205I12C是半導體生產的絕佳選擇。即使在處理最苛刻的應用程序時,它也能提供極高的準確性,其節能設計可快速生產高質量的芯片。這種步進器是高端芯片生產的完美工具,導致更好的產量和更低的成本。
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