二手 NIKON NSR 2205 i12C #293752261 待售

ID: 293752261
晶圓大小: 6"
優質的: 1997
Stepper, 6" Resolution (NA=0.57): Within 0.45 µm DOF: 0.8 µm Lens Distortion (incl. magnification error): Within ±55 nm Lens Distortion Stability: Within ±20 nm Focus Stability: Within ±0.25 µm Open Frame (Max. Exposure Area): 22.0 mm × 22.0 mm (17.96–25.20) Auto Focus Calibration Repeatability: 3σ ≤ 100 nm Auto Focus Offset Range: Within ±20 µm Lamp Power: 700 mW/cm² Lamp Uniformity: Within 1.5 % Dose Control Accuracy (Integrated Exposure Stability): Within ±1.0 % Reticle Blind: +0.4 mm ~ +0.8 mm Reticle Alignment Accuracy: Absolute value within ±0.02 µm of target value, Repeatability within 0.015 µm LSA Overlay Accuracy: |X| + 3σ ≤ 0.065 µm FIA Overlay Accuracy: |X| + 3σ ≤ 0.065 µm Stepping Accuracy: ±0.04 µm (3σ) Orthogonality: Within ±0.1 sec Wafer Stage Flatness: Within 2.0 µm / 200 mm Chip Leveling: Within 4.8 µrad / 22 mm Wafer Prealignment Repeatability: 3σ within 15 µm Self Measurement Program (Option): Automatic Temperature: 23°C Chamber Type: S20 NA Variable System Reticle Size: 6" (Normal) Reticle Microscope: Fix Max Field Size: 22 mm PPD Reticle Barcode Reader Reticle Loader: Standard (13 Slot) Reticle Case: 6" Standard Pre Alignment Wafer Loader: Type2 Chip Leveling Wafer Carrier Table: Left, Right Alignment Sensor: LSA, FIA Rack Type: Normal (Right) Body‑OP Ruck Cable: 3 m (Normal) No Wafer Edge Exposure Lamp Power: 2 kW (Normal) Illumination: SHRINC3 1997 vintage.
NIKON NSR 2205 i12C Wafer Stepper是一種全自動、高精度的光刻設備,設計用於生產光掩模和光柵。該系統配備12英寸可變狹縫攝像機(VSC)和12英寸視場(FOV),可確保卓越的成像質量和卓越的吞吐量。其實時散焦控制單元(RDC)確保了晶圓成像的卓越性能。它由智能i系列控制器(i12C)提供動力,提供高端性能和運營效率。它還提供對功能和設置的即時訪問,並簡化了手動數據輸入。軟件功能,如智能縫隙選擇器(ISS),提高了操作效率和可靠性。NIKON NSR-2205I12C能夠在提供精確的曝光均勻性的同時以高速預先對準和步進。它被編程為提供與目標統一控制(TUC)一致的暴露一致性。晶圓步進器還提供了良好的溫度穩定性和平穩的操作控制效果的熱漂移。NSR 2205 i12C可以曝光高達300毫米(12英寸)曝光範圍的晶片,滿足當今最苛刻的半導體加工需求。它可以在785 nm波長下達到半微米的分辨率,確保最大保真度和對最先進的10nm工藝節點的支持。NSR-2205I12C專有的六軸電機(SAM)為模式叠加和曝光優化提供了優化的垂直掃描功能。自動刀具維護(ASM)功能可確保用戶在長期內獲得可靠的現場操作。NIKON NSR 2205 i12C Wafer Stepper專為快速、高效和可靠的成像工作流而設計。其高端光學和先進的軟件平臺使其成為要求苛刻的半導體成像過程的理想選擇。其先進的技術和先進的功能為用戶提供了盡可能高的晶圓成像質量和操作可靠性。
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