二手 ULTRATECH Titan II #9207808 待售

Wafer stepper, 4"-8" Reticle size: 5 x 5" Reticle library: 12-Slots / Bar code reader Projection ratio 1:1 Lens resolution: 2 um Field size: 44 mm x 22 mm Wavelength: GH Substrate size: 2"-6" Wafer handling: Cassette to cassette / Interface (12) Reticle storages with bar code reader Stage: Monolithic structure Linear motor drive PC: VME Bus controller CPU 68030 Graphics monitor Vibration control: Active air isolation Alignment: Global: 120 nm, 3seconds Site by site: < 120 nm, 3seconds Alignment spectrum: 500-650 nm (2) Targets per field required Imaging and lens: Feature size: 2.0 micron Lens distortion: 120 nm Colinearity: 80 nm Maximum image area: 55 mm x 18 mm Exposure spectrum: Broadband: 390 nm - 450 nm Wafer plane intensity: > 1200 mW/cm² Uniformity: 2.0% Reticle: Substrate type: 6" x 6" x 0.25" / 5" x 5" x 0.09" quartz Field / Row: 2-5 Pellicle standoff: 2.0 mm Square, 4.5": >83 WPH (100 mJ / cm²) 65 WPH (800 mJ / cm²) Round, 6": >75 wph (100 mJ / cm²) 55 wph (800 mJ / cm²) Field change time: <10 seconds Reticle change time: <120 seconds Alignment target: Compatible with 200 mm scribe DOF: 6 um Illuminator: 1000 W Uniformity: 3% GENMARK Wafer handler Environmental chamber HP / HEWLETT-PACKARD 362 Computer running HPL CE Marked.